Crystal growth crucible and crystal growth furnace

A technology of crystal growth and crucible, applied in the directions of crystal growth, single crystal growth, single crystal growth, etc., can solve the problems of easy cracking of crystals, and achieve the effect of reducing radial temperature gradient and solving easy cracking of crystals.

Pending Publication Date: 2018-05-11
BEIJING SEVENSTAR ELECTRONICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The present invention aims to solve at least one of the technical problems existing in the prior art, and proposes a crystal growth crucible and a crystal growth furnace, which can effectively reduce the radial temperature gradient of the crystal thermal field, thereby solving the problem of growing large-sized The problem that the crystal is easy to crack when crystallized

Method used

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  • Crystal growth crucible and crystal growth furnace
  • Crystal growth crucible and crystal growth furnace
  • Crystal growth crucible and crystal growth furnace

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Embodiment 1

[0026] figure 1 For the structural schematic diagram of the application of the crystal growth crucible provided by the embodiment of the present invention, please refer to figure 1 , the crystal growth crucible provided by the embodiment of the present invention is provided with an installation position for fixing the seed crystal 4 on its top wall (such as figure 1 The position of the seed crystal 4), the raw material 6 for growing crystals is arranged in the crucible; a heat transfer layer 2 is also arranged on the installation position, and the thermal conductivity on the plane where the heat transfer layer 2 is located is greater than the thermal conductivity on the thickness direction, The thickness direction is along the figure 1 in the vertical direction.

[0027] In the present invention, since the thermal conductivity of the heat transfer layer 2 on its plane is greater than the thermal conductivity in its thickness direction, that is, the heat conduction effect of ...

Embodiment 2

[0041] An embodiment of the present invention provides a crystal growth furnace, including a crystal growth crucible and a heating device, the heating device is used to heat the crystal growth crucible, so that the growth environment in the crucible reaches the process temperature, and the crystal growth crucible The crystal growth crucible provided in Embodiment 1 of the present invention was used.

[0042]The crystal growth furnace provided by the embodiment of the present invention, because it adopts the crystal growth crucible provided by the above-mentioned embodiment 1, can effectively reduce the radial temperature gradient of the crystal thermal field, thereby solving the problem of crystal growth when growing large-sized crystals. Easy cracking problem.

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Abstract

The invention provides a crystal growth crucible, wherein an installation position for fixing a seed crystal is arranged on the top wall of the crystal growth crucible, a heat transfer layer is arranged on the installation position, and the heat conductivity coefficient on the plane of the heat transfer layer is larger than the thermal conductivity in the thickness direction. According to the present invention, with the crystal growth crucible and the crystal growth furnace, the radial temperature gradient of the crystal thermal field can be effectively reduced, such that the problem that thecrystal easily cracks during the growth of the large-size crystal can be solved.

Description

technical field [0001] The invention belongs to the technical field of crystal growth, and in particular relates to a crystal growth crucible and a crystal growth furnace. Background technique [0002] As a third-generation semiconductor material, silicon carbide has excellent physical and chemical properties, and has broad application prospects and market space in the fields of high-end optoelectronics, high power, and microwave radio frequency. [0003] At present, the physical vapor transport method (PVT for short) is the most mature and common method for forming and growing silicon carbide. The working principle of the PVT method is mainly: place the silicon carbide raw material on the bottom of the crucible and fix the seed crystal on the top of the crucible, and sublimate the silicon carbide raw material at high temperature (for example, above 2200°C) and low pressure. The sublimation gas uses the crystal thermal field The temperature gradient finally crystallizes on ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B23/00C30B29/36
CPCC30B23/00C30B29/36
Inventor 李龙远
Owner BEIJING SEVENSTAR ELECTRONICS CO LTD
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