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Method and system for focus adjustment of a multi-beam scanning electron microscopy system

An electron microscope and multi-beam technology, applied in the field of focus adjustment, can solve the problems of reducing the usability of inspection tools and taking a long time to acquire images

Active Publication Date: 2018-05-11
KLA TENCOR TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The time to acquire images can be relatively long, which reduces the usability of inspection tools

Method used

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  • Method and system for focus adjustment of a multi-beam scanning electron microscopy system
  • Method and system for focus adjustment of a multi-beam scanning electron microscopy system
  • Method and system for focus adjustment of a multi-beam scanning electron microscopy system

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Embodiment Construction

[0026] Reference will now be made in detail to the disclosed subject matter which is illustrated in the accompanying drawings. Referring generally to FIG. 1 , a system and method for rapid focus adjustment in a multi-beam scanning electron microscopy (SEM) imaging system is described in accordance with the present invention.

[0027] Embodiments of the present invention relate to providing an automated method for rapidly focusing a multi-beam SEM system. In a multibeam SEM system, a large number (eg, 2 to 200) of sub-images can be acquired simultaneously, which together form a larger continuous image. In some embodiments of the invention, multiple sub-images are acquired with different focus and / or astigmatism properties. Based on these images, embodiments of the invention identify the optical settings for achieving the best focus and / or the least amount of astigmatism in images acquired using the multi-beam SEM system of the invention.

[0028] Figure 1A A system 100 for ...

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PUM

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Abstract

A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configuredto form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding to the identified best focus image.

Description

[0001] Cross References to Related Applications [0002] This application is asserted under 35USC §119(e) filed September 23, 2015 by Mark McCord, Rainer Knippelmeyer, Douglas Masnaghetti , Richard Simmons and Scott Young are inventors titled TECHNIQUES FOR RAPID FOCUS ADJUSTMENTIN A MULTIPLE-BEAM IMAGING SYSTEM 62 / 222,325, and constitutes a regular (non-provisional) patent application for said application, which is hereby incorporated by reference in its entirety. technical field [0003] The present invention relates generally to scanning electron microscopy and in particular the present invention relates to focus adjustment in multibeam electron microscopy systems. Background technique [0004] Fabricating semiconductor devices, such as logic and memory devices, typically involves processing a substrate, such as a semiconductor wafer, using a multitude of semiconductor fabrication processes to form various features and multiple levels of the semiconductor device. As se...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B21/20H01J37/317
CPCG02B21/20H01J37/21H01J37/28H01J2237/1205H01J2237/1532H01J2237/216H01J2237/221H01J2237/12H01J37/153H01J37/3177
Inventor M·A·麦科德R·克尼彭迈耶D·马斯纳盖蒂R·R·西蒙斯S·A·永
Owner KLA TENCOR TECH CORP
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