Method and device for improving uniformity and production efficiency of X-ray reflector thin film
A technology of film uniformity and production efficiency, applied in the field of optical films, can solve problems such as low production efficiency, film thickness error, and the same, and achieve the effect of ensuring thickness consistency, thickness uniformity, and high control accuracy
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[0037] The size of the linear magnetron sputtering target gun used in this embodiment is 508mm×38mm, because the sputtering rate along the length direction of the target gun is not the same, so a new mask is added between the target surface and the sample holder Plate structure, and the shape of the mask plate is a pair of arc-shaped long thin metal plates. The width of the exposed target surface is inversely proportional to the sputtering rate at this position, so as to correct the uniformity of the coating thickness.
[0038] When preparing a strip-shaped spherical mirror film with a length of 500mm, a width of 60mm, and a height of 40mm, the sample is vertically placed on the sample holder. At a distance of 45mm from the target surface (optimized by the process, this distance is the best position for film formation), two symmetrical masks are installed parallel to the target surface. The specific size of the mask is in Figure 5 shown in , and the speed regulation curve to ...
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