Method and device for improving uniformity and production efficiency of X-ray reflector thin film

A technology of film uniformity and production efficiency, applied in the field of optical films, can solve problems such as low production efficiency, film thickness error, and the same, and achieve the effect of ensuring thickness consistency, thickness uniformity, and high control accuracy

Pending Publication Date: 2018-06-26
TONGJI UNIV
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  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

But this method has two disadvantages: 1. The production efficiency is not high, because only one mirror can be placed at a time when using this method for coating, and the process of putting and taking also includes steps such as vacuuming and inflating. It takes a very long time to plate several mirror samples at the same time
2. The thickness consistency of the film on different mirrors cannot be guaranteed
However, if this method is used for coating, it is difficult to ensure that the process parameters of multiple coatings are exactly the same, because there will also be a certain film thickness error between different mirror films.

Method used

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  • Method and device for improving uniformity and production efficiency of X-ray reflector thin film
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  • Method and device for improving uniformity and production efficiency of X-ray reflector thin film

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Embodiment 1

[0037] The size of the linear magnetron sputtering target gun used in this embodiment is 508mm×38mm, because the sputtering rate along the length direction of the target gun is not the same, so a new mask is added between the target surface and the sample holder Plate structure, and the shape of the mask plate is a pair of arc-shaped long thin metal plates. The width of the exposed target surface is inversely proportional to the sputtering rate at this position, so as to correct the uniformity of the coating thickness.

[0038] When preparing a strip-shaped spherical mirror film with a length of 500mm, a width of 60mm, and a height of 40mm, the sample is vertically placed on the sample holder. At a distance of 45mm from the target surface (optimized by the process, this distance is the best position for film formation), two symmetrical masks are installed parallel to the target surface. The specific size of the mask is in Figure 5 shown in , and the speed regulation curve to ...

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Abstract

The invention relates to a method and a device for improving the uniformity and production efficiency of an X-ray reflector thin film. According to the method, a linear magnetron sputtering target gunis used for carrying out reflector coating, film thickness uniformity in the length direction of the thin film on a reflector is adjusted by arranging a mask plate in a sputtering direction of the target gun, and meanwhile, the film thickness of the reflector and the uniformity in the width direction of the thin film on the reflector are adjusted by controlling the speed at which the reflector passes the target gun. Compared with the prior art, the thickness uniformity deviation of the multiple reflectors at different positions within 2% can be realized, the film thickness uniformity is ensured, and meanwhile the production efficiency is improved.

Description

technical field [0001] The invention relates to the technical field of optical thin films, in particular to a method and a device for improving the thin film uniformity and production efficiency of an X-ray reflector. Background technique [0002] With the development of X-ray optics, the demand for elongated mirrors of various sizes in the beamline is also increasing. Due to the limitation of the X-ray refractive index characteristics, the refractive index of all materials is close to 1, so if you want to get a high-intensity reflected beam, you must use the grazing incidence method. For X-rays of different wavelengths, the refractive index is also different, and correspondingly is the difference in the size of the grazing incidence angle. For lower energy X-rays, the required grazing incidence angle is larger, so as an optical mirror element for reflecting low energy X-rays, it is only necessary to use a smaller size (length less than 200mm) mirror, which is reflected It...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/04C23C14/50
CPCC23C14/042C23C14/35C23C14/505
Inventor 张众黄秋实沈正祥
Owner TONGJI UNIV
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