A kind of exposure method and the manufacturing method of film pattern
An exposure method and thin film pattern technology, which are applied to the photolithography process of pattern surface, microlithography exposure equipment, photolithography process exposure device, etc., can solve the problems of inconsistency in actual size, etc.
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[0034] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0035] The embodiment of the present application provides an exposure method, such as figure 1 As shown, the method includes:
[0036] S101. Obtain a preset mask pattern, the hollow area of the mask pattern is as follows figure 2 The position of the region to be exposed 101 on the film layer 10 to be exposed corresponds to that shown.
[0037] It should be noted that the above-mentioned photomask pattern is a preset pattern that needs to be formed on the ...
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