Carrier storage enhancement type super-junction IGBT
A technology of carrier storage and trench gate, applied in electrical components, circuits, semiconductor devices, etc., can solve problems such as unobstructed, prone to breakdown, affecting device reliability, etc.
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[0057] The present invention will be described in detail below in conjunction with the accompanying drawings.
[0058] figure 1 (a) is a schematic diagram of the structure of a common semi-superjunction IGBT. Compared with the super-junction IGBT, the semi-super-junction IGBT has one more between the n-pillar (n-pillar area 31) and the p-pillar (p-pillar area 32) and the n-type buffer zone (n-buffer area 20) for An n-type auxiliary layer (n-assist layer 30) that bears part of the applied voltage, wherein the doping concentration of the n-type auxiliary layer (n-assist layer 30) may be lower than or equal to the doping concentration of the n region (n-pillar region 31) concentration. When a voltage exceeding the threshold voltage is applied to the gate (G), an electronic channel is formed near the interface between the base region (p-b1 region 41) and the gate dielectric (48); if a voltage exceeding 0.7V is applied to the collector (C) The positive voltage, electrons pass t...
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