Broadband anti-reflection hydrophobic film and preparation method thereof
A technology of hydrophobic film and anti-reflection film, which is applied in the field of broadband anti-reflection hydrophobic film and its preparation, which can solve the problems that the transmittance of the film layer does not meet the requirements of photovoltaic modules, no hydrophobic anti-reflection film found, and no hydrophobic anti-reflection film, etc., to achieve the production cost Low cost, little difference in film thickness, and the effect of improving photoelectric conversion efficiency
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Embodiment 1
[0026] Ordinary architectural glass coating:
[0027] Preparation of silica sol (anti-reflection solution): Inorganic SiO 2 Precursor tetraethyl orthosilicate, absolute ethanol, and ammonia water are mixed in a volume ratio of 0.7:30:1.5, and magnetically stirred at 60°C for 12 hours (specific operation: now add ammonia water to absolute ethanol and place it in a constant temperature oil bath In the pot, after the solution is stable, tetraethyl orthosilicate is added dropwise to absolute ethanol containing ammonia) and then aged at room temperature for 3 days, crushed with an ultrasonic cell pulverizer for 10 minutes, and then treated with 0.22 μm partial fluoride Use after membrane filtration.
[0028] Preparation of hydrophobic modification solution for anti-reflection film: Prepare hexadecyltrimethoxysilane, deionized water and absolute ethanol according to the volume ratio of 1:12:87, put it in a 100 ml beaker, and hydrolyze it with constant temperature magnetic stirring ...
Embodiment 2
[0036] Small area FTO glass coating:
[0037] Preparation of silica sol (anti-reflection solution): Inorganic SiO 2 Precursor tetraethyl orthosilicate, absolute ethanol, and ammonia water are mixed in a volume ratio of 0.7:30:1.5, and magnetically stirred at 60°C for 12 hours (specific operation: now add ammonia water to absolute ethanol, and place it in a constant temperature oil bath In the pot, after the solution is stable, tetraethyl orthosilicate is added dropwise to absolute ethanol containing ammonia) and then aged at room temperature for 3 days, crushed with an ultrasonic cell pulverizer for 10 minutes, and then treated with 0.22 μm partial fluoride Use after membrane filtration.
[0038] Preparation of hydrophobic modification solution for anti-reflection film: Prepare hexadecyltrimethoxysilane, deionized water and absolute ethanol according to the volume ratio of 2: 11: 87, put it in a 100 ml beaker, and hydrolyze it with constant temperature magnetic stirring at 35...
Embodiment 3
[0046] Large-area photovoltaic glass coating:
[0047] The present invention can not only coat small glass materials, but also coat large photovoltaic glass according to production and living needs.
[0048] 1. Mix the hydrophobic modification solution and the silica sol solution at a volume ratio of 1:5, stir them, and add them to the medicine box of the coating equipment.
[0049] 2. Put the 1635*985mm photovoltaic glass on the feeding place, start the coating equipment, wash it with disc brush, roller brush, fine washing liquid, rinse and air-dry it, and then transport it to the coating place. The spray speed is 1~5ml / s ( The current spray speed is 5ml / s), and the moving speed is 5~10mm / s (the current moving speed is 8mm / s) to pull the film, and send it into the oven after completion.
[0050] 3. Set the temperature at 100-150°C, the time for 1-4h, and the humidity at 40-70 for drying (at this stage, the coating temperature is set at 110°C and the humidity is 65 for 2 hour...
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Abstract
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