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Method for producing HfC-SiC multiphase gradient coating layer by chemical vapor co-deposition technology

A chemical vapor phase, gradient coating technology, applied in the field of preparation of HfC-SiC multiphase gradient coating, can solve problems such as thermal expansion mismatch, and achieve the effects of alleviating thermal stress, short reaction period and high chemical stability

Active Publication Date: 2018-08-14
NORTHWESTERN POLYTECHNICAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In order to avoid the deficiencies of the prior art, the present invention proposes a method for preparing HfC-SiC multiphase gradient coatings by chemical vapor co-deposition to overcome the thermal expansion mismatch problem between coatings and C / C composite materials

Method used

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  • Method for producing HfC-SiC multiphase gradient coating layer by chemical vapor co-deposition technology
  • Method for producing HfC-SiC multiphase gradient coating layer by chemical vapor co-deposition technology
  • Method for producing HfC-SiC multiphase gradient coating layer by chemical vapor co-deposition technology

Examples

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Embodiment 1

[0023] The selected density is 1.75g / cm 3 The C / C composite material is used as the matrix, and HfCl is selected 4 , CH 4 / C 3 h 6 , Si as a precursor, using chemical vapor co-deposition technology at 1500 ° C, with H 2 The HfC-SiC multiphase gradient coating was prepared as the reducing gas and Ar as the dilution and protective gas.

[0024] The prepared C / C substrate was polished with 340-mesh wet sandpaper, and then ultrasonically cleaned with deionized water at room temperature (25°C) for 5 minutes. After cleaning twice, it was placed in a blast oven at 80°C. Dry for 4 hours, take out and set aside. Place the prepared C / C substrate in the isothermal zone of the vertical isothermal chemical vapor deposition furnace, and then add HfCl 4 The powder is placed in the feeding device, and the Si powder is placed in the stocker below the isothermal zone (such as figure 1 As shown), the deposition temperature is set to 1500°C, the heating rate is 7.0°C / min to ensure that the...

Embodiment 2

[0026] The selected density is 1.75g / cm 3 The C / C composite material is used as the matrix, and HfCl is selected 4 , CH 4 / C 3 h 6 , Si as a precursor, using chemical vapor co-deposition technology at 1400 ° C, with H 2 The HfC-SiC multiphase gradient coating was prepared as the reducing gas and Ar as the dilution and protective gas.

[0027] The prepared C / C substrate was polished with 340-mesh wet sandpaper, and then ultrasonically cleaned with deionized water at room temperature (25°C) for 5 minutes. After cleaning twice, it was placed in a blast oven at 80°C. Dry for 4 hours, take out and set aside. Place the prepared C / C substrate in the isothermal zone of the vertical isothermal chemical vapor deposition furnace, and then add HfCl 4 The powder is placed in the feeding device, and the Si powder is placed in the stocker below the isothermal zone (such as figure 1 As shown), set the deposition temperature to 1400°C, the heating rate to 7.0°C / min, to ensure that the p...

Embodiment 3

[0029] The selected density is 1.75g / cm 3 The C / C composite material is used as the matrix, and HfCl is selected 4 , CH 4 / C 3 h 6 , Si as a precursor, using chemical vapor co-deposition technology at 1300 ° C, with H 2 The HfC-SiC multiphase gradient coating was prepared as the reducing gas and Ar as the dilution and protective gas.

[0030] The prepared C / C substrate was polished with 340-mesh wet sandpaper, and then ultrasonically cleaned with deionized water at room temperature (25°C) for 5 minutes. After cleaning twice, it was placed in a blast oven at 80°C. Dry for 4 hours, take out and set aside. Place the prepared C / C substrate in the isothermal zone of the vertical isothermal chemical vapor deposition furnace, and then add HfCl 4 The powder is placed in the feeding device, and the Si powder is placed in the stocker below the isothermal zone (such as figure 1 As shown) set the deposition temperature to 1300°C, the heating rate to 7.0°C / min, to ensure that the pr...

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Abstract

The invention relates to a method for producing a HfC-SiC multiphase gradient coating layer by a chemical vapor co-deposition technology. The HfC-SiC multiphase gradient coating layer is deposited onthe surface of a C / C composite material by the chemical vapor co-deposition technology. The HfC-SiC multiphase gradient coating layer produced by the method realizes the gradient distribution of thermal expansion coefficients by controlling the structural constituent of the coating layer in order to fundamentally solves the mismatch of the thermal expansion coefficients between the coating layer and a substrate. The produced coating is well combined to the substrate, and can realize the control of the structural constituent, and the method using the chemical vapor phase co-deposition technology has the advantages of short production period, simple process and low cost. The surface of the HfC-SiC multi-phase gradient coating layer produced on the surface of the C / C composite material in theinvention has no cracks, and the bonding strength between the coating layer and the substrate is good.

Description

technical field [0001] The invention belongs to a preparation method of an HfC-SiC multiphase gradient coating, and relates to a method for preparing an HfC-SiC multiphase gradient coating by a chemical vapor co-deposition method. Background technique [0002] Carbon / carbon (C / C) composite materials have unique properties such as low density, high specific strength, high specific modulus, low thermal expansion coefficient, excellent ablation resistance and high temperature mechanical properties, and are one of the most ideal high temperature structural materials. It has extremely broad application prospects in extreme environments in the fields of aviation and aerospace. However, in extreme service environments, C / C composites are not only easy to oxidize, but also show insufficient ablation resistance, and the oxidation ablation rate of the material increases rapidly with the increase of temperature, and its oxidation ablation will lead to The mechanical properties of the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B41/87
CPCC04B41/009C04B41/5059C04B41/87C04B35/83C04B41/5057C04B41/4531
Inventor 冯涛李贺军付前刚童明德
Owner NORTHWESTERN POLYTECHNICAL UNIV
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