Femtosecond laser pre-dissociation device and chemical vapor deposition equipment

Abstract

The invention relates to the technical field of chemical vapor deposition, and provides a femtosecond laser pre-dissociation device, which comprises a femtosecond laser dissociation module and a highRydberg atomic detection module, the femtosecond laser dissociation module and the high Rydberg atomic detection module are connected through a first pipe, and the first pipeline is provided with a valve. The invention further provides chemical vapor deposition equipment, which comprises a reaction gas supply source, a reaction cavity and the femtosecond laser pre-dissociation device. According tothe invention, the reaction gas is catalyzed and dissociated in advance by the femtosecond laser dissociation module, the reaction gas is dissociated into CH2 or CH before entering the reaction cavity, so that the production efficiency is greatly improved and the pollution to the air is reduced, the components of the gas such as H2, CH3, CH2 or CH and the like are analyzed by the high Rydberg atomic detection module and fed back to the femtosecond laser dissociation module for real-time adjusting the optimized power density and the time domain distribution so as to better control the processof the catalytic reaction.

Description

technical field [0001] The invention relates to the technical field of chemical vapor deposition, in particular to a femtosecond laser pre-dissociation device and chemical vapor deposition equipment. Background technique [0002] Chemical vapor deposition is a widely used film material preparation technology. Its working principle is to pass two or more selected gases into the reaction chamber, guide the airflow to the substrate, and pass energy such as microwaves at the substrate. Field dissociation realizes the chemical reaction of the gas, and the target simple substance produced by the reaction is deposited on the substrate. [0003] In existing systems for growing diamond using microwave plasma chemical vapor deposition (MPCVD), the role of microwave plasma is to cause high-energy electrons in the plasma to collide with neutral gas molecules, thereby breaking, exciting and activating chemical bonds. working gas. The process is as follows: Introduce two gases into the ...

AI Technical Summary

Problems solved by technology

[0010] However, when using traditional CVD equipment for diamond film deposition, the problem of low deposition rate of diamond film has always been a major bottleneck in the development of this technology, especially when preparing high-quality diamond films with large areas. Usually only about 1 μm / h, because it can be clearly seen from the above formula that in order to obtain the target reactant C, it needs to go through 4 steps, and it can be seen that in these steps, a lot of exhaust gas will be discharged, including H 2 , CH 2 or CH 3 or CH 4 Wait, it also pollutes the air to a certain extent

Images