X-ray fluorescence thin layer mass thickness measurement system and method based on reference element

Abstract

The invention relates to the technical field of X-ray fluorescence analysis, aims at overcoming the defects that the measurement results of an existing X-ray fluorescence measurement system and methodcan be easily influenced by fluctuation of performance of an instrument and the existing X-ray fluorescence measurement system and method are not applicable to measurement on mass thickness of a thinlayer taking metal elements as major components, and provides X-ray fluorescence thin layer mass thickness measurement system and method based on a reference element. The measurement system comprisesan X-ray tube, a collimator, a detector, a base and a control terminal, wherein the input terminal of the collimator is connected with an exit portal of the X-ray tube, and a tungsten pinhole is formed in the output terminal of the collimator; the control terminal is respectively electrically connected with the X-ray tube and the detector; a reference layer containing the reference element is pasted and placed on the surface of the substrate, and the surface of the reference layer is used for placing a standard sample layer or a to-be-measured sample layer; the X-ray tube is used for emittingX rays, and the base is located on a light path of the X rays; the X rays vertically irradiate the reference layer after passing through the collimator and the tungsten pinhole; and the detector is used for receiving X-ray excited fluorescence.

Description

technical field [0001] The invention relates to the technical field of X-ray fluorescence analysis, in particular to a system and method for measuring the quality and thickness of X-ray fluorescence thin layers based on reference elements. Background technique [0002] X-ray fluorescence analysis method is widely used in modern material analysis, geological exploration, article security inspection and other fields due to its advantages of wide application range, high measurement efficiency and precision, and non-destructive analysis. [0003] Among them, in terms of material mass thickness measurement, a variety of measurement systems and methods have been developed, including the absolute measurement method that directly calibrates the X-ray fluorescence intensity of the sample, the fluorescence relative measurement method based on infinitely thick materials, and Substrate fluorescence absorption method for material samples, scattering correction method for samples containi...

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Problems solved by technology

[0008] The purpose of the present invention is to overcome the measurement result of existing X-ray fluorescence measurement system and method is susceptible to the impact of instrument performance fluctuation, or is not applicable to the deficiency that the thin layer mass thickness of taking metal element as main component is measured, and provides based on X-ray fluorescence thin layer mass thickness measurement system and method of reference elements

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