Conductive and reflective layer and application thereof in electrochromic device

An electrochromic device, conductive reflection technology, applied in instruments, optical components, optics, etc., can solve the problem of high light loss value

Pending Publication Date: 2018-09-07
NINGBO MI RUO ELECTRONICS TECH CO LTD
View PDF5 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the resistance of the double metal layer is low, which is conducive to the improvement of the color change rate, but the loss value of the light is relatively high, generally reaching about 20%.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Conductive and reflective layer and application thereof in electrochromic device
  • Conductive and reflective layer and application thereof in electrochromic device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0047] according to figure 1 The structure shown is magnetron sputtering (metal niobium target, purity 99.9%, oxygen-argon mixed atmosphere, sputtering pressure 0.2Pa, oxygen-argon partial pressure ratio 4 / 6, sputtering power 4KW, sputtering time 20min) on the glass substrate 11 to deposit a layer of niobium pentoxide layer 12 with a thickness of 400 nm; using metallic silver as the target material, through magnetron sputtering (silver target, purity 99.99%; sputtering conditions: background Vacuum is 1×10 -3 Pa, the working pressure is 0.3Pa, the power is 16W, and the time is 5min) deposit a layer of silver reflective layer 13 with a thickness of 10 nm on the niobium pentoxide layer; by (1-x)ZnO+xAl 2 o 3 (x = 2 wt%) sintered ceramics as the target, by radio frequency magnetron sputtering (room temperature, oxygen and argon mixed atmosphere, sputtering pressure is 0.5Pa, oxygen partial pressure is 1×10 -2 Pa, the power is 100W, and the time is 30min), a layer of aluminum-d...

Embodiment 2

[0049] according to figure 2 The structure shown is made of 10 wt% SnO 2 and 90 wt%In 2 o 3 The sintered ceramics are used as the target material, and the radio frequency magnetron sputtering method (room temperature, oxygen and argon mixed atmosphere, sputtering pressure is 0.5Pa, oxygen partial pressure is 1×10 -2 Pa, the power is 100W, and the time is 30 minutes) on the first glass substrate 21, a conductive layer of indium tin oxide 22 with a thickness of 150 nm is plated.

[0050] by (1-x)ZnO+xAl 2 o 3 (x = 2 wt%) sintered ceramics as the target, by radio frequency magnetron sputtering (room temperature, oxygen and argon mixed atmosphere, sputtering pressure is 0.5Pa, oxygen partial pressure is 1×10 -2 Pa, the power is 100W, and the time is 40 minutes) on the second glass substrate 30, a layer of aluminum-doped zinc oxide layer 29 with a thickness of 200 nm is coated. Using metal gold as the target material, through radio frequency magnetron sputtering (gold target...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention relates to a conductive and reflective layer and application thereof in an electrochromic rearview mirror. The conductive and reflective layer is mainly characterized by comprising a transparent metallic oxide layer, a metallic reflective layer, a transparent conductive layer and a high-refraction-rate layer in sequence, and one side of the high-refraction-rate layer can further comprise a low-refraction-rate layer and a second high-refraction-rate layer in sequence. The conductive and reflective layer has low loss of visible light. The electrochromic rearview mirror has a widercolor change interval and higher sensitivity.

Description

technical field [0001] The invention relates to the field of electrochromic, in particular to the conductive reflective layer structure in the electrochromic rearview mirror. Background technique [0002] Electrochromic materials are materials that change reversibly in color under an applied electric field. Among them, when a certain polarity voltage is applied to the electrochromic material or disappears, the color of the material becomes lighter and the light transmittance increases accordingly. This phenomenon is called "fading"; when the polarity of the voltage is opposite or applied When , the color of the material deepens and the light transmittance decreases, a phenomenon called "coloration". Electrochromic materials can be used to make a variety of devices and be applied in many fields to improve the working and living environment. For example, the anti-glare rearview mirror for automobiles developed by using electrochromic technology can reduce the strong glare fr...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/157G02B5/08
CPCG02B5/0808G02F1/157
Inventor 曹贞虎胡珊珊
Owner NINGBO MI RUO ELECTRONICS TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap