Photoresist and micro-nano temperature and humidity sensitivity intelligent device and preparation methods thereof

A photoresist and device technology, applied in optomechanical equipment, photosensitive materials for optomechanical equipment, instruments, etc., to achieve the effect of increasing photothermal effect, wide light response band, and enhanced free radical activity

Inactive Publication Date: 2018-09-21
HUAZHONG UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Femtosecond laser direct writing technology integrates precision machinery, digital technology, ultrafast lasers and advanced material disciplines. It has the ability to process nano-additive and subtractive materials. Optical manufacturing technology can prepare micro-nano machinery, models and optical devices, etc. However, non-intelligent resin materials, proteins, metals / ceramics and other materials are widely used at present, and the formed structures or patterns of the laser direct writing technology are static and non-stimulating Responsive or controllable intelligent deformation capability, no environmental adaptability

Method used

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  • Photoresist and micro-nano temperature and humidity sensitivity intelligent device and preparation methods thereof
  • Photoresist and micro-nano temperature and humidity sensitivity intelligent device and preparation methods thereof
  • Photoresist and micro-nano temperature and humidity sensitivity intelligent device and preparation methods thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0060] First, polynitrogen-isopropylacrylamide (2mol), methyl methacrylate (1mol), methylene blue (0.9 mg per ml of the mixture of thermosensitive monomer and hydrophilic acrylate) and ethanol (solute: solvent) The volume ratio is 10:0.9) as the photoresist component, and each component is prepared for use according to the amount of each component; then methyl methacrylate is dropped into ethanol, and ultrasonically shaken for 5 minutes; then polynitrogen-isopropyl is added Acrylamide, add a stirring vibrator and stir for 5 hours at a stirring speed of 900 rpm, remove the precipitate by centrifugation, and centrifuge at a speed of 3000 rpm; finally add methylene blue powder, ultrasonically vibrate for 10 minutes, stir for 4 hours, centrifuge again for purification, and centrifuge Speed ​​7000 rpm.

[0061] The density of the photoresist is similar to that of water, it has strong fluidity, is not viscous, and is light blue. The processing threshold region of low power processin...

Embodiment 2

[0063] First, poly-vinyl isobutyl amine (3 mol), polyethylene glycol diacrylate (1 mol), mercaptobenzothiazole (1.1 mg per ml of the mixture of thermosensitive monomer and hydrophilic acrylate) and Ethylene glycol (solute:solvent volume ratio is 5:1) is the photoresist component, and each component is prepared for use according to the amount of each component; then polyethylene glycol diacrylate is dropped into ethylene glycol, and ultrasonically oscillated 10 minutes; then add poly-vinyl isobutyl amide, magnetic stirring for 8 hours, stirring speed 1600 rpm; finally add mercaptobenzothiazole powder, ultrasonically vibrate for 15 minutes, stir for 8 hours, centrifuge again for purification, centrifugal speed 8000 rev / min to prepare a photoresist.

[0064] The photoresist has strong fluidity and transparent color on the glass substrate. Because the initiator activity is weaker than that of methylene blue, the low processing threshold region is 1-20mW, the high power threshold r...

Embodiment 3

[0066] First, polynitrogen-isopropylacrylamide (2.2mol), polyethylene glycol dimethacrylate (1mol), 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl) ) butanone (0.7 mg per milliliter of the mixture of temperature-sensitive monomer and hydrophilic acrylate) and ethanol (solute:solvent volume ratio of 10:1.5) are photoresist formulations, and each component is prepared according to the amount of each component. The ingredients are ready for use; then drop polyethylene glycol diacrylate in ethanol, and ultrasonically shake for 60 minutes; then add polyoxyethylene ether, stir magnetically for 5 hours, and stir at 1200 rpm; finally add 2-benzyl-2 -Dimethylamino-1-(4-morpholinophenyl)butanone powder, ultrasonically oscillated for about 60 minutes, stirred for 10 hours, and centrifuged again at 9000 rpm for purification to prepare a photoresist.

[0067] The low processing threshold region of the photoresist laser processing is 15-50 mW, the high power threshold region is 70-1200 mW, ...

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Abstract

The invention belongs to the technical field of photoresist and laser direct writing, and discloses photoresist and a micro-nano temperature and humidity sensitivity intelligent device and preparationmethods thereof. The photoresist comprises a thermosensitive monomer, hydrophilic acrylate, cationic photoinitiator and a solvent, the molar ratio of the thermosensitive monomer to hydrophilic acrylate is (0.5-5):1, each milliliter of mixed liquid of the thermosensitive monomer and the hydrophilic acrylate contains 0.6-2 mg of cationic photoinitiator, the ratio of the total volume of the thermosensitive monomer, the hydrophilic acrylate and the cationic photoinitiator to the volume of the solvent is 10:(0.5-3), the micro-nano temperature and humidity sensitivity intelligent device is preparedfrom the photoresist. The prepared photoresist has hydrophilicity and alcohol affinity, and the prepared intelligent device has the temperature and humidity sensitivity property, and has the advantages of being simple in preparation technology, convenient to operate and the like.

Description

technical field [0001] The invention belongs to the technical field of photoresist and laser direct writing, and more specifically relates to a photoresist, a micro-nano temperature-humidity sensitive intelligent device and a preparation method thereof. Background technique [0002] Smart materials are the fourth generation of materials after natural, synthetic polymers, and artificially designed materials. Functionalization and diversification of functions. Smart materials have new properties due to unique chemical functional groups or doped nanomaterials: hydrophilic and hydrophobic, self-healing, photo-driven, conductive, magnetic-sensing, high flexibility or mechanical strength, and its photopolymerization effect and ablation in the sub-wavelength region Effect is the basis and guarantee for optical manufacturing of high-quality micro-nano devices. [0003] Femtosecond laser direct writing technology integrates precision machinery, digital technology, ultrafast lasers ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G03F7/004
CPCG03F7/004G03F7/027
Inventor 熊伟陶宇峰王锐青蔡颂王帆曾晓雁陆永枫
Owner HUAZHONG UNIV OF SCI & TECH
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