Fenton-assisted three-phase flowing pressure cavitation polishing SiC optimal curved surface method and device

Abstract

The invention discloses a Fenton-assisted three-phase flowing pressure cavitation polishing SiC optimal curved surface method. Firstly, the parts, have no need to be machined, of SiC workpieces are wrapped by insulation materials; then, the SiC workpieces are dipped in a reaction pool with a Fenton reagent; after a period of time for reaction, the workpieces are taken out and fixed in a polishingliquid container by a fixture; a series and parallel connection polishing platform controls poses of a cylindrical polishing tool relative to the workpieces, so that a tiny machining gap is always kept between the polishing tool and the surfaces of the workpieces; the tool and the workpieces are totally dipped in the polishing liquid; a servo motor drives the cylindrical polishing tool to rotate at high speed; an ultrasonic bubble generation mechanism continuously adjusts poses of an amplitude change rod relative to a dynamic pressure area; and along with polishing, an abrasive particle current circulating system circularly conveys abrasive particles in a polishing container. The invention further provides a Fenton-assisted three-phase flowing pressure cavitation polishing SiC optimal curved surface. The method improves the polishing efficiency under the precondition of not generating the surface and subsurface damage.

Description

technical field [0001] The invention relates to the technical field of ultra-precision machining, and provides a Fenton-assisted three-phase flow pressure cavitation polishing method and device for SiC optical curved surfaces. Background technique [0002] With the development of science and technology, the electronic information manufacturing industry has become a basic and strategic industry of the country. At the same time, the technical level and development scale of this industry have also become one of the symbols of the country's technological innovation level and comprehensive national strength. The manufacture of optoelectronics and microelectronics is the current core content of the electronic information manufacturing industry. The development of microelectronics and optoelectronics technology makes the performance requirements of electronic devices higher and higher. As a third-generation semiconductor material, SiC has many significant advantages compared with ...

AI Technical Summary

Problems solved by technology

[0009] In order to overcome the shortcomings of existing surface and subsurface damages when polishing SiC workpieces, the present invention proposes a Fenton-assisted three-phase flow pressure cavitation polishing method and device for SiC optical curved surfaces, without causing surface and subsurface damage. Under the premise, improve the polishing efficiency

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