Nanometer material preparing system and technology for manufacturing nanometer materials through system

Abstract

The invention discloses a nanometer material preparing system and a technology for manufacturing nanometer materials through the system. The system comprises an atomization device for performing quantified atomization on a liquid precursor, a plasma reactor for generating powder nanometer materials, a nanometer powder collecting device for separating the powder nanometer material and a gas phase,a tail gas treatment device for processing the separated gas phase and an intelligent control system. The technology comprises the following steps of 1 preparing a precursor solution, 2 exciting a plasma, 3 atomizing the precursor, 4 injecting the plasma through an atomization liquid drop method, 5 collecting the powder nanometer materials, 6 performing gas-liquid separation and 7, performing tailgas treatment. The preparing system and technology can be applied to various precursor substances suitable for being atomized, and have the advantage of being wide in application range; the system can continuously prepare and collect the nanometer materials and is high in production efficiency, simple in technological process, controllable in process and high in automatic degree.

Description

technical field [0001] The invention relates to the technical field of nanomaterial preparation, in particular to a nanomaterial preparation system and a process for producing nanomaterials using the system. Background technique [0002] Nanomaterials refer to materials whose size in at least one direction is less than 100nm, and can be divided into zero-dimensional nanomaterials, one-dimensional nanomaterials and two-dimensional nanomaterials according to their dimensions. Nanomaterials have significant surface effects, small size effects, macroscopic quantum tunneling effects, dielectric confinement effects, etc. These series of effects make nanomaterials exhibit special physical and chemical properties that are significantly different from macroscopic materials. These special properties make nanomaterials have extensive and important applications in the fields of energy, environment, functional new materials, medical treatment, and information technology. However, due to...

AI Technical Summary

Problems solved by technology

However, the precursors used in the plasma chemical vapor deposition method are usually gaseous substances or substances that can be vaporized by plasma, which severely limits its application range.

Moreover, the PCVD method is usually batch production, with low efficiency, and is not suitable for the preparation and collection of powder materials

Images