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Gas mixture control in a gas discharge light source

A gas mixture, gas discharge technology, used in laser monitoring devices, circuits, lasers, etc.

Active Publication Date: 2018-09-28
西默有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Operating gas discharge light sources

Method used

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  • Gas mixture control in a gas discharge light source
  • Gas mixture control in a gas discharge light source
  • Gas mixture control in a gas discharge light source

Examples

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Embodiment Construction

[0049] refer to figure 1 , the gas discharge light source 100 includes a gas discharge system 105 and a gas maintenance system 110 . The light source 100 is configured as part of the optical system 115 supplying a pulsed beam 120 which is directed to an output device 125 such as figure 2 A lithographic exposure setup for patterning microelectronic features on a wafer is shown). The pulsed beam 120 may be directed through a beam preparation system 130 placed between the gas discharge light source 100 and the output device 125 .

[0050] Gas discharge system 105 includes one or more gas discharge chambers 135 . Each gas discharge chamber 135 houses an energy source 140 and contains a gas mixture 145 including a gain medium as well as other gases. For example, the gas mixture includes a mixture of gain medium and buffer gas. The gain medium is a laser-active entity within a gas mixture, and it can be a single atom or a molecule or a pseudo-molecule. Thus, population invers...

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Abstract

A gas discharge light source includes a gas discharge system that includes one or more gas discharge chambers. Each of the gas discharge chambers in the gas discharge system is filled with a respective gas mixture. For each gas discharge chamber, a pulsed energy is supplied to the respective gas mixture by activating its associated energy source to thereby produce a pulsed amplified light beam from the gas discharge chamber. One or more properties of the gas discharge system are determined. A gas maintenance scheme is selected from among a plurality of possible schemes based on the determinedone or more properties of the gas discharge system. The selected gas maintenance scheme is applied to the gas discharge system. A gas maintenance scheme includes one or more parameters related to adding one or more supplemental gas mixtures to the gas discharge chambers of the gas discharge system.

Description

[0001] Cross References to Related Applications [0002] This application claims the benefit of U.S. Provisional Application No. 62 / 276,522, entitled "GASMIXTURE CONTROL IN A GAS DISCHARGE LIGHT SOURCE," filed January 8, 2016 by References are incorporated herein in their entirety. technical field [0003] The subject matter of the present disclosure relates to the control of gas mixtures in gas discharge light sources producing pulsed light beams. Background technique [0004] One class of gas discharge light sources used in lithography is known as excimer light sources or lasers. Excimer lasers typically use a combination of a noble gas (such as argon, krypton, or xenon) and an active species (such as fluorine or chlorine). The excimer laser gets its name from the fact that under the right conditions of electrical stimulation (of the energy supply) and high voltage (of the gas mixture) pseudo-molecules called excimers are created, which Exists only in the energized sta...

Claims

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Application Information

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IPC IPC(8): H01S3/036H01S3/097H01S3/225
CPCH01S3/036H01S3/097H01S3/10069H01S3/0014H01S3/2308H01S3/2255H01S3/2258H01S3/104H01S3/2256H01S3/0971H01S3/225H01S3/2253H01S3/2251
Inventor R·阿拉瓦特T·亚加瓦尔
Owner 西默有限公司
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