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Color filter substrate and manufacturing method thereof

A technology of color film substrate and manufacturing method, which is applied in the field of color film substrate and its manufacturing, can solve the problem of high limitation of the preparation method of quantum dot color film layer, achieve rich preparation methods, ensure conversion rate, and high preparation flexibility Effect

Active Publication Date: 2021-10-15
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The embodiment of the present invention provides a color filter substrate and a manufacturing method thereof, which can solve the problem of relatively restrictive preparation methods of the quantum dot color filter layer in the related art

Method used

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  • Color filter substrate and manufacturing method thereof
  • Color filter substrate and manufacturing method thereof
  • Color filter substrate and manufacturing method thereof

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Embodiment Construction

[0037] In order to make the object, technical solution and advantages of the present invention clearer, the implementation manner of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0038] figure 1 It is a flowchart of a method for manufacturing a color filter substrate provided by an embodiment of the present invention, as shown in figure 1 As shown, the method includes:

[0039] Step 101, providing a base substrate.

[0040] Step 102, forming a black matrix on the base substrate.

[0041] Step 103, using the quantum dot material mixed with the ester compound to form a quantum dot material layer on the base substrate on which the black matrix is ​​formed.

[0042] Step 104, using a sol-gel method to react the ester compound in the quantum dot material layer to form a sol-gel layer doped with nanoparticles.

[0043] Step 105, curing the sol-gel layer to obtain a quantum dot color film layer.

[0044] To sum u...

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Abstract

The invention discloses a color filter substrate and a manufacturing method thereof, belonging to the technical field of display. The method includes: providing a base substrate; forming a black matrix on the base substrate; using a quantum dot material mixed with an ester compound, forming a quantum dot material layer on the base substrate formed with the black matrix ; using a sol-gel method to react the ester compound in the quantum dot material layer to form a sol-gel layer doped with nanoparticles; curing the sol-gel layer to obtain quantum dots Color film layer. The invention solves the problem that the preparation method of the quantum dot color film layer is highly restrictive in the related art. The invention is used in the manufacture of color filter substrates.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a color filter substrate and a manufacturing method thereof. Background technique [0002] Thin Film Transistor Liquid Crystal Display (English: Thin Film Transistor Liquid Crystal Display; abbreviation: TFT-LCD) includes a liquid crystal panel, a backlight and a drive circuit board, wherein the liquid crystal panel is composed of an array substrate, a color filter substrate, and an array substrate and a color filter substrate. The liquid crystal layer in between. TFT-LCD is a non-active light-emitting element, which needs to be provided by a backlight source. By controlling the rotation angle of the liquid crystal, a grayscale display of black and white is formed, and then a color display screen is formed through the color-resist layer on the color filter substrate. [0003] The traditional color filter substrate realizes color display based on the principle of light filtering...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/1335
CPCG02F1/133512G02F1/133514G02F1/133516G02F1/133617G02F2202/36G02F2202/38
Inventor 于晶陈右儒禹钢
Owner BOE TECH GRP CO LTD
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