Preparation method of fireproof hollow glass
A glass and hollow technology is applied in the field of preparation of fire-resistant insulating glass, which can solve the problems of low safety, single-layer glass is easily broken and scattered, single-layer glass has no thermal insulation and flame-retardant interlayer, etc., and achieves high safety and flame retardant. performance and the effect of superior thermal insulation and fire resistance
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Embodiment 1
[0044] A preparation method of fireproof insulating glass, the preparation method is as follows:
[0045] S.1 Coating photoresist on the back of the glass, and then preparing a stripe array by photolithography;
[0046] The photolithography steps described therein are as follows:
[0047] (1) Coat the back of the glass with AZP 4620 positive-type photoresist, and then bake it on a hot plate at 95°C for 5 minutes. The thickness of the obtained photoresist is 5 microns;
[0048] (2) Then perform photolithography under the condition of light intensity of 2.7mW / cm2, photolithography for 200s,
[0049] (3) Use AZ300 MIF developer solution to develop it, the development time is 150s, and rinse with deionized water for 1 minute after development.
[0050] S.2 Immerse the back of the glass obtained in step S.1 in a glass corrosion solution, and corrode it at 35°C for 5 hours to obtain a glass with grooves with a width of 1 cm and a depth of 0.5 mm on the back;
[0051] The glass co...
Embodiment 2
[0061] A preparation method of fireproof insulating glass, the preparation method is as follows:
[0062] S.1 Coating photoresist on the back of the glass, and then preparing a stripe array by photolithography;
[0063] The photolithography steps described therein are as follows:
[0064] (1) Coat the back of the glass with AZP 4620 positive photoresist, and then bake it on a hot plate at 105°C for 3 minutes, and the thickness of the obtained photoresist is 15 microns;
[0065] (2) Then at a light intensity of 3.0mW / cm 2 Under the conditions of photolithography, photolithography 200s,
[0066] (3) Use AZ300 MIF developer solution to develop it, the development time is 200s, and rinse with deionized water for 3 minutes after development.
[0067] S.2 Immerse the back of the glass obtained in step S.1 in a glass corrosion solution, and corrode it at 42°C for 2 hours to obtain a glass with grooves with a width of 1 cm and a depth of 2 mm on the back;
[0068] The glass corros...
Embodiment 3
[0078] A preparation method of fireproof insulating glass, the preparation method is as follows:
[0079] S.1 Coating photoresist on the back of the glass, and then preparing a stripe array by photolithography;
[0080] The photolithography steps described therein are as follows:
[0081] (1) Coat the back of the glass with AZP 4620 positive photoresist, and then bake it on a hot plate at 100°C for 4 minutes. The thickness of the obtained photoresist is 10 microns;
[0082] (2) Then perform photolithography under the condition of light intensity of 2.8mW / cm2, photolithography for 150s,
[0083] (3) Use AZ300 MIF developer solution to develop it, the development time is 180s, and rinse with deionized water for 2 minutes after development.
[0084] S.2 Immerse the back of the glass obtained in step S.1 in a glass corrosion solution, and corrode it at 38°C for 3 hours to obtain a glass with grooves with a width of 1 cm and a depth of 1 mm on the back;
[0085] The glass corros...
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