Sputtering target for magnetic recording medium, and magnetic thin film

A sputtering target, non-magnetic technology, applied in the field of sputtering targets, can solve problems such as adhesion problems, and achieve the effects of improving device characteristics, improving yield, and reducing the amount of powder particles

Active Publication Date: 2018-10-23
JX NIPPON MINING & METALS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, in the sputtering process, adhering substances called particles on the thin film formation substrate become a problem

Method used

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  • Sputtering target for magnetic recording medium, and magnetic thin film
  • Sputtering target for magnetic recording medium, and magnetic thin film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～6

[0058] (Examples 1 to 6: non-magnetic phase C, etc.)

[0059] Prepare Fe powder and Pt powder as magnetic materials, prepare C powder as non-magnetic materials, prepare FeO powder, Fe 3 o 4 Powder, K 2 O powder, Na 2 O powder, PbO powder, and ZnO powder are used as low-viscosity oxides. Then, these powders were weighed to obtain the composition ratios described in Table 1.

[0060] Next, for each of Examples 1 to 6, the weighed powders were placed in a ball mill pot with a capacity of 10 liters together with zirconia balls as grinding media, and mixed by rotating for 24 hours. Then, the mixed powder taken out from the ball mill was filled in a carbon mold with a diameter of 190 mm, and sintered by hot pressing. The conditions of the hot pressing were set to a vacuum atmosphere, a heating rate of 300° C. / hour, a holding temperature of 1050° C., a holding time of 2 hours, and pressurization at 30 MPa from the start of heating to the end of holding. After completion of hold...

Embodiment 7～12

[0065] (Examples 7 to 12: non-magnetic phase B, etc.)

[0066] Prepare Fe powder and Pt powder as magnetic materials, prepare B powder as non-magnetic materials, prepare FeO powder, Fe 3 o 4 Powder, K 2 O powder, Na 2 O powder, PbO powder, and ZnO powder were used as low-viscosity oxides, and these powders were weighed to obtain the composition ratios listed in Table 1. Then, for each of Examples 7 to 12, a sintered body was produced by the same method as in Examples 1 to 6. The cross-section of the obtained sintered body was observed with a microscope in the same manner as in Examples 1 to 6, and it was confirmed that the structure of the non-magnetic phase was dispersed in the magnetic phase. In addition, for each of Examples 7 to 12, the average area per one nonmagnetic particle was calculated in the same manner as in Examples 1 to 6. The results are shown in Table 1. Next, sputtering was performed in the same manner as in Examples 1 to 6 using each of the sintered bo...

Embodiment 13～18

[0067] (Examples 13 to 18: non-magnetic phase BN, etc.)

[0068] Prepare Fe powder and Pt powder as magnetic materials, prepare BN powder as non-magnetic materials, prepare FeO powder, Fe 3 o 4 Powder, K 2 O powder, Na 2 O powder, PbO powder, and ZnO powder were used as low-viscosity oxides, and these powders were weighed to obtain the composition ratios listed in Table 1. Then, for each of Examples 13 to 18, a sintered body was produced by the same method as that of Examples 1 to 6. The cross-section of the obtained sintered body was observed with a microscope in the same manner as in Examples 1 to 6, and it was confirmed that the structure of the non-magnetic phase was dispersed in the magnetic phase. Moreover, about each example of Examples 13-18, the average area per one nonmagnetic particle was calculated similarly to Examples 1-6. The results are shown in Table 1. Next, sputtering was performed in the same manner as in Examples 1 to 6 using each of the sintered bod...

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Abstract

A sputtering target or a film that is characterized by having 0.1-10mol% of an oxide comprising one or more compounds selected from FeO, Fe3O4, K2O, Na2O, PbO, and ZnO, and 5-70mol% of Pt, the remainder comprising Fe. The present invention addresses the problem of providing a sputtering target that can greatly reduce particles originating from a non-magnetic material and can significantly improveyield during film formation. The present invention thus allows film formation for a high quality magnetic recording layer, and can improve yield for a magnetic recording medium.

Description

technical field [0001] The present invention relates to a sputtering target suitable for forming a magnetic thin film in a magnetic recording medium. In particular, it relates to a sputtering target having a structure in which a nonmagnetic phase is dispersed in a magnetic phase mainly composed of Fe—Pt. Background technique [0002] In the field of magnetic recording represented by hard disk drives, a perpendicular magnetic recording method in which an easy axis of magnetization is oriented in a direction perpendicular to a recording surface has been put into practical use. Especially in hard disk media using the perpendicular magnetic recording method, in order to achieve higher recording density and lower noise, it is being developed to surround magnetic crystal grains oriented in the vertical direction with non-magnetic materials and reduce the magnetic interaction between magnetic particles. Magnetic thin film with granular structure. [0003] A ferromagnetic alloy ma...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C23C14/06G11B5/64G11B5/851H01F10/14H01F41/18
CPCG11B5/851H01F10/14H01F41/18G11B5/65C23C14/3414C23C14/06H01J37/3429G11B5/658C23C14/34
Inventor 小庄孝志
Owner JX NIPPON MINING & METALS CORP
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