Welding waste gas treatment unit for semiconductor device manufacturing
A waste gas treatment device and semiconductor technology, which can be applied in combination devices, chemical instruments and methods, dispersed particle separation, etc., can solve problems such as polluting the atmosphere, affecting human health, and air pollution, and achieving stable and controllable airflow and good treatment effect. , to ensure the effect of stability
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Embodiment 1
[0023] Embodiment 1: A kind of welding waste gas treatment device for the manufacture of semiconductor devices, including ionization barrel 1, ionization rod 8, main sedimentation bottle 10 and air pump 15, one end of at least one air intake pipe 2 is connected to the said ionization barrel 1 On the side wall, the other end of the air inlet pipe 2 is used to be connected to the welding furnace 18, and the air inlet pipe 2 is provided with a temperature detector 3, a manual valve 4 and two flow detectors 5 all connected to the differential pressure sensor 6 , the manual valve 4 is located between two flow detectors 5;
[0024] The ionization rod 8 is embedded in the cavity of the ionization barrel 1, several ionization needles 9 are arranged around the outer wall of the ionization rod 8, and the main sedimentation bottle 10 is installed at the bottom of the ionization barrel 1;
[0025] The upper part of the ionization barrel 1 is connected to one end of the exhaust pipe 11, th...
Embodiment 2
[0027] Embodiment 2: A kind of welding waste gas treatment device for the manufacture of semiconductor devices, including ionization barrel 1, ionization bar 8, main sedimentation bottle 10 and air pump 15, one end of at least one air intake pipe 2 is connected to the said ionization barrel 1 On the side wall, the other end of the air inlet pipe 2 is used to be connected to the welding furnace 18, and the air inlet pipe 2 is provided with a temperature detector 3, a manual valve 4 and two flow detectors 5 all connected to the differential pressure sensor 6 , the manual valve 4 is located between two flow detectors 5;
[0028] The ionization rod 8 is embedded in the cavity of the ionization barrel 1, several ionization needles 9 are arranged around the outer wall of the ionization rod 8, and the main sedimentation bottle 10 is installed at the bottom of the ionization barrel 1;
[0029] The upper part of the ionization barrel 1 is connected to one end of the exhaust pipe 11, th...
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