Surface cleaning device for solar cell panel production

Abstract

The invention discloses a surface cleaning device for solar cell panel production. The surface cleaning device comprises a fixed base, wherein an electric rotary table is arranged on the top of the fixed base; a four-leaf petal shaped station base is fixedly arranged on the top of the electric rotary table; a loading station, a primary sweeping station, a sweeping station and a secondary sweepingstation are arranged on the station base; the position, at the outer side of the electric rotary table, of the top of the fixed base is equipped with three L-shaped brackets which are sequentially equipped with a primary sweeping device, a cleaning device and a secondary sweeping device. The surface cleaning device adopts four stations to sequentially perform charging and discharging, primary sweeping, cleaning and secondary sweeping on the surface of the solar cell panel, so that dust on the surface of the solar cell panel is cleared more completely.

Description

technical field [0001] The invention belongs to the technical field of new energy material manufacturing, and in particular relates to a surface cleaning device for solar panel production. Background technique [0002] After screen printing, there will also be debris residues on the surface of the solar panel, which will have a negative impact on the subsequent sintering process. Therefore, it is a necessary step to clean up the sundries on the surface of the solar panel. The existing technology is to install an air blowing device directly above the silicon wafer, and manually operate to carry out vertical blowing on the surface of the silicon wafer. However, it is not enough to effectively remove the micro particles on the surface of the silicon wafer; and the manual operation is limited to manual operation proficiency and There are more uncontrollable factors, such as the degree of seriousness, which will lead to an increase in the unqualified rate of subsequent screen pr...

AI Technical Summary

Problems solved by technology

The existing technology is to install an air blowing device directly above the silicon wafer, and manually operate to carry out vertical blowing on the surface of the silicon wafer. However, it is not enough to effectively remove the micro particles on the surface of the silicon wafer; and the manual operation is limited to manual operation proficiency and There are more uncontrollable factors, such as the degree of seriousness, which will lead to an increase in the unqualified rate of subsequent screen printing or a decrease in product durability.

[0003] In addition, when the existing technology removes the particles on the surface of the battery board, it can remove the larger particles on the surface of the battery board, but the effect on the fine particles with a small particle size is not ideal. The specific surface of the fine particles is large, and the contact area with the battery board is large. , and the surface energy is larger than that of large particles, and the cohesion is stronger. It is difficult to clean the fine particles by blowing alone

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