Surface cleaning device for solar cell panel production

A surface cleaning device and solar panel technology, applied in the direction of cleaning methods using tools, cleaning methods using gas flow, cleaning methods and appliances, etc., can solve the problem of large surface energy, strong adhesion, and reduced durability of products and other problems, to achieve the effect of reducing the adhesion, cleaning thoroughly, and reducing the contact area

Inactive Publication Date: 2018-11-27
杨岩
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The existing technology is to install an air blowing device directly above the silicon wafer, and manually operate to carry out vertical blowing on the surface of the silicon wafer. However, it is not enough to effectively remove the micro particles on the surface of the silicon wafer; and the manual operation is limited to manual operation proficiency and There are more uncontrollable factors, such as the degree of seriousness, which will lead to an increase in the unqualified rate of subsequent screen printing or a decrease in pr

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  • Surface cleaning device for solar cell panel production
  • Surface cleaning device for solar cell panel production
  • Surface cleaning device for solar cell panel production

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Embodiment Construction

[0020] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0021] The present invention provides such Figure 1-4 The shown surface cleaning device for solar cell panel production includes a fixed base 1, an electric rotary table 2 is arranged on the top of the fixed base 1, and a four-leaf petal-shaped tool is fixedly arranged on the top of the electric rotary table 2. The station base 3 is provided with a feeding station 6, a primary purging station 7, a cleaning station 8 and a secondary purging station 9. The top ...

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Abstract

The invention discloses a surface cleaning device for solar cell panel production. The surface cleaning device comprises a fixed base, wherein an electric rotary table is arranged on the top of the fixed base; a four-leaf petal shaped station base is fixedly arranged on the top of the electric rotary table; a loading station, a primary sweeping station, a sweeping station and a secondary sweepingstation are arranged on the station base; the position, at the outer side of the electric rotary table, of the top of the fixed base is equipped with three L-shaped brackets which are sequentially equipped with a primary sweeping device, a cleaning device and a secondary sweeping device. The surface cleaning device adopts four stations to sequentially perform charging and discharging, primary sweeping, cleaning and secondary sweeping on the surface of the solar cell panel, so that dust on the surface of the solar cell panel is cleared more completely.

Description

technical field [0001] The invention belongs to the technical field of new energy material manufacturing, and in particular relates to a surface cleaning device for solar panel production. Background technique [0002] After screen printing, there will also be debris residues on the surface of the solar panel, which will have a negative impact on the subsequent sintering process. Therefore, it is a necessary step to clean up the sundries on the surface of the solar panel. The existing technology is to install an air blowing device directly above the silicon wafer, and manually operate to carry out vertical blowing on the surface of the silicon wafer. However, it is not enough to effectively remove the micro particles on the surface of the silicon wafer; and the manual operation is limited to manual operation proficiency and There are more uncontrollable factors, such as the degree of seriousness, which will lead to an increase in the unqualified rate of subsequent screen pr...

Claims

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Application Information

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IPC IPC(8): H01L31/18H01L21/67B08B1/04B08B5/02
CPCB08B1/04B08B5/02H01L21/67028H01L31/1876Y02E10/50Y02P70/50
Inventor 杨岩
Owner 杨岩
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