A system and method for adjusting water film coverage of supercritical water oxidation evaporation wall reactor

Abstract

The invention discloses a system and a method for adjusting a water film coverage rate of a supercritical water-oxidation transpiring wall reactor. The system comprises a transpiring wall water pump,a gas supercharging pump, a material pump and a supercritical water-oxidation transpiring wall reactor; the supercritical water-oxidation transpiring wall reactor is a cylindrical shape and comprisesan outer pressure-bearing wall, and a cylindrical porous transpiring wall is arranged in the outer pressure-bearing wall; an annular space formed in the porous transpiring wall is a supercritical water-oxidation reaction area; an outlet of the transpiring wall water pump is connected with a water inlet of the porous transpiring wall by virtue of a pipeline; outlets of the gas supercharging pump and the material pump are connected with an inlet of the supercritical water-oxidation transpiring wall reactor by virtue of a pipeline; the porous transpiring wall adopts a conical structure; the wallthickness of the porous transpiring wall is gradually increased from top to bottom; and the cross section of a single side wall of the porous transpiring wall is a right-angle trapezoidal shape. By improving the transpiring wall structure and controlling the parameters, the formation of a water film can be optimized, and the system and the method can be used for optimizing and adjusting the performance parameters of the water film of the supercritical water-oxidation transpiring wall reactor.

Description

technical field [0001] The invention relates to the technical field of supercritical water oxidation and evaporation wall reactors, in particular to a system and method for optimizing and adjusting the water film coverage of supercritical water oxidation and evaporation wall reactors. Background technique [0002] Supercritical water oxidation technology is a very valuable organic pollutant treatment technology. It uses supercritical water to dissolve organic substances and oxidants, so that organic substances can undergo a homogeneous reaction in an oxygen-enriched environment, thereby quickly and thoroughly Convert organic matter into harmless substances such as carbon dioxide and water, as well as inorganic salts. [0003] The application of supercritical water oxidation technology to highly toxic, high-concentration, and biodegradable organic waste has the following advantages: fast reaction speed, high treatment efficiency, no formation of secondary pollutants, no need ...

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Problems solved by technology

[0006] At present, research on the formation and mechanism of water film on the porous evaporation wall is relatively scarce, and the formation and protection of the water film cannot be effectively controlled; the coverage of the water film on the porous evaporation wall of the supercritical water oxidation evaporation wall reactor is an indicator of the quality of the water film. An important indicator that can directly characterize the continuity and uniformity of water film formation and distribution;

[0007] The upper part of the supercritical water oxidation evaporation wall reactor is the main area of ​​the oxidation reaction, and the upper part is a supercritical environment of high temperature and high pressure; the high temperature and high pressure conditions in the upper supercritical region and the existence of violent chemical reactions make the convection between the main fluid and the water film Diffusion and mixing are extremely strong, resulting in low water film coverage in the upper supercritical region; in addition, when the coupling relationship between the selected operating parameters is inappropriate, the water film coverage in the entire reactor will also be low, and the water The film is discontinuous; the main operating parameters and structure of the evaporation wall reactor will affect the formation of the water film, thereby affecting the coverage of the water film

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