Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Laser polishing system and method

A laser polishing and laser technology, which is applied in the field of laser polishing systems, can solve the problems that the polished surface of the workpiece cannot achieve the polishing effect and the polishing accuracy is not high, and achieve the effect of improving the polishing yield.

Active Publication Date: 2021-02-02
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But for now, the mainstream laser polishing technology used in the industry is to achieve polishing only through the photothermal coupling effect and photochemical action of laser radiation and material surface, but the polishing accuracy of this laser polishing technology is not good when polishing the workpiece surface. High, it will cause the polished surface of a large number of workpieces to fail to achieve the desired polishing effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Laser polishing system and method
  • Laser polishing system and method
  • Laser polishing system and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0039]In order to make the purpose, technical solutions and advantages of the embodiments of this application clearer, the technical solutions in the embodiments of this application will be described clearly and completely in conjunction with the drawings in the embodiments of this application. Obviously, the described embodiments It is a part of the embodiments of this application, but not all the embodiments. The components of the embodiments of the present application generally described and shown in the drawings herein may be arranged and designed in various different configurations.

[0040]Therefore, the following detailed description of the embodiments of the present application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely represents selected embodiments of the present application. Based on the embodiments in this application, all other embodiments obtained by a person of ordinary skill in the art without creativ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
Login to View More

Abstract

The present application provides a laser polishing system and method. The system includes a control unit, a laser transmitter, a beam shaping component, a mobile platform and a laser interferometer. The object to be polished is fixed on the mobile platform and driven by the mobile platform; the beam shaping component is set on the laser light path of the laser transmitter, which is used to shape the laser beam and project the shaped laser onto the surface of the object to be polished The control unit is electrically connected with the laser interferometer to control the laser interference to detect the polished surface shape of the surface to be polished to obtain the corresponding surface shape detection data; the control unit is also connected with the laser transmitter, the beam shaping component and the mobile The platform and electrical connection are used to control the laser emitter, the beam shaping component and the mobile platform according to the surface shape detection data, so that the object to be polished can achieve the target polishing effect. The system can perform high-precision polishing treatment on the object to be polished, and improve the polishing yield of the object.

Description

Technical field[0001]This application relates to the technical field of laser polishing, and specifically to a laser polishing system and method.Background technique[0002]Laser polishing technology is a technology for surface treatment of new materials that has emerged with the development of laser technology. It uses laser beam scanning to process the surface of the workpiece, and uses the interaction between the laser and the material to remove excess material on the surface of the workpiece. Thus forming a smooth plane. But for the moment, the mainstream laser polishing technology used in the industry is only through the photothermal coupling and photochemical effects of laser radiation and the surface of the material to achieve polishing, but this laser polishing technology does not have the same polishing accuracy when polishing the surface of the workpiece. High, will cause the polishing surface of a large number of workpieces to fail to achieve the desired polishing effect.Su...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B23K26/352B23K26/03B23K26/064B23K26/70
CPCB23K26/032B23K26/0648B23K26/064B23K26/702
Inventor 李亚国袁志刚许乔王度金会良耿锋刘志超欧阳升王健张清华
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com