Method for producing a workpiece (64) made of
quartz glass, which has at least one melt-polished workpiece surface (113) for use in a
plasma-assisted manufacturing process, comprising the process steps: a) Providing a workpiece (64) made of
quartz glass which has at least one raw surface (111) produced by
cutting or
machining, and b)
Polishing the raw surface (111) to the polished workpiece surface (113) by
laser polishing using at least one
laser beam (81) moving relative to the raw surface (111), wherein the relative movement is generated by superimposing a translational-oscillating movement and a feed movement, wherein, as a result of the translational-oscillating movement, a quasi-line (87) is generated by a
relative velocity between the raw surface (111) and the
laser beam (81) above 500 mm / s, and wherein the feed movement has a
relative velocity between the raw surface (111) and the laser beam (81) between 1 mm / s and 50 mm / s, c) and wherein a polished workpiece surface (113) is produced which has a micro-roughness and
waviness, wherein the
white light interferometry at a spatial
wavelength λ OMicroroughness measured in the range of 1 µm to 10 µm has a
surface roughness Sa of less than 0.5 nm, characterized in that the measurement is taken by means of a
white light interferometer at a spatial
wavelength in the range λ O
Surface roughness (
waviness) measured from 100 µm to 1000 µm has a value Sa of more than 5 nm, where the quasi-line (87) has a
radiation intensity within the quasi-line (87) on the workpiece (64) between 10 W / cm² 2 and 1000 W / cm² 2 is produced wherein, for
laser polishing of an annular end face (80) of a hollow cylindrical workpiece (64), the feed movement comprises rotation of the end face (80) about the longitudinal axis (84), and the translational-oscillating movement comprises a reversing movement of the laser beam (81) between an inner workpiece surface (85) and an outer workpiece surface (86), and wherein the speed of the translational-oscillating movement is set higher in the region of the inner surface (85) than in the region of the outer surface (86).