Composite polishing method based on laser and plasma
A plasma and composite polishing technology, applied in the field of mechanical processing, can solve the problems of low material removal rate, poor processing quality, and low polishing efficiency
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[0051] 1: Take silicon carbide with a surface roughness of about 200nm-300nm, and simply clean and degrease the surface.
[0052] 2: Use a three-dimensional profiler to measure the surface to be polished.
[0053] 3: Put the silicon carbide sample in such as figure 1 On the polishing system workbench 7 of the laser plasma composite polishing system shown, the laser polishing device is set with a laser power of 30 mW, a pulse repetition frequency of 100 Hz, a laser wavelength of 800 nm, a scanning speed of 1 mm / s, and a laser beam incident angle of 50°; plasma polishing device set input power 500W, He flow rate 15L / min, O 2 The flow rate is 0.2SCCM / min. After the plasma polishing device generates a stable plasma discharge, the reaction gas CF is introduced 4 , the reactive gas CF 4 The flow rate is set to 0.15SCCM / min, and the processing system is started to start processing.
[0054] 4: Remove the processed silicon carbide from the workbench, wipe it with absolute alcohol,...
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