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A device for improving the accuracy of wavefront measurement and correction and its application method

A technology of wavefront measurement and correction accuracy, applied in the field of laser system beam quality control, can solve the problems of high accuracy of wavefront measurement and correction effect, etc., and achieve the effect of high accuracy

Active Publication Date: 2019-12-27
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The traditional wavefront correction system includes a set of deformable mirrors and high-voltage drivers, a set of wavefront sensors, and a set of control software. The measurement and correction of wavefront distortion are all based on the results of one experiment, and the wavefront measurement and correction effects are highly accurate. Difficult to guarantee

Method used

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  • A device for improving the accuracy of wavefront measurement and correction and its application method
  • A device for improving the accuracy of wavefront measurement and correction and its application method
  • A device for improving the accuracy of wavefront measurement and correction and its application method

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Embodiment 1

[0035] Such as figure 1As shown, a device for improving wavefront measurement and correction accuracy includes a wavefront sensor 2, a deformable mirror 3, a beam reduction system, a beam splitter 4, a reflector 5 and a controller, wherein the wavefront sensor 2, deformable mirror 3 It forms a closed-loop system with the controller, the beam splitter 4 is arranged obliquely, and the beam splitter 4 and the deformable mirror 3 are arranged on the same optical axis, and after the incident laser beam 1 to be corrected passes through the beam splitter 4, most of the light beam is transmitted to the deformable mirror 3, A small part of the beam is directly reflected and output, and the incident laser beam 1 reflected by the deformable mirror 3 is divided into the sampling beam 8 and the output beam by the beam splitter 4 again, and the sampling beam 8 is incident on the mirror 5, the beam reduction system and the wavefront sensor in turn 2. That is to say, the reflector 5 , the be...

Embodiment 2

[0044] The same part of this embodiment and Embodiment 1 will not be described again, the difference is:

[0045] The diameter of the incident laser beam 1 is 30×30mm, the wavelength is 1053nm, the diameter of the beam splitter 4 is 80×80mm, and the reflectivity to 1053nm laser is 1%, and the deformable mirror 3 is a wavefront corrector driven by a piezoelectric film. Shown, the aperture of reflecting mirror 5 is 80 * 80mm, 99.95% to 1053nm laser reflectivity, the aperture of lens 6 is 50 * 50mm, and focal length is 60cm, and the aperture of variable focal length liquid lens 7 is 9 * 9mm, by controlling The voltage can continuously change the focal length from 5cm to infinity. The wavefront sensor 2 is a Hartmann wavefront sensor, and the parameters are shown in Table 2.

[0046] Table 1: Main technical parameters of wavefront corrector

[0047] Effective caliber 30mm×30mm Drive count and layout 5×5 square Minimum closed loop bandwidth 1hz drive...

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Abstract

The invention relates to a device for improving the accuracy of wavefront measurement and correction, and a use method thereof, and belongs to the technical field of beam quality control of a laser system. The device comprises a wavefront sensor, a deformable mirror, a controller, a beam reduction system, a beam splitter mirror and a reflector, wherein an incident laser beam to be corrected is transmitted to the deformable mirror after passing through the beam splitter mirror, the incident laser beam reflected by the deformable mirror is divided into a sampling beam and an output beam after passing through the beam splitter mirror, and the sampling beam is sequentially incident to the reflector, the beam reduction system and the wavefront sensor. The invention provided by the invention changing the beam reduction ratio of the beam reduction system on the sampling beam and adjusting the aperture of the sampling beam incident to the wavefront sensor to obtain the wavefront distortion ofmultiple groups of sampling beams with different apertures, wavefront correction is performed by using the deformable mirror to obtain multiple groups of different wavefront correction voltages, and finally an average value of the wavefront distortion and the wavefront correction voltages is extracted to obtain accurate wavefront distortion and an accurate wavefront correction voltage of the incident laser beam, and the accuracy of the correction result is high.

Description

technical field [0001] The invention belongs to the technical field of beam quality control of a laser system, and in particular relates to a device for improving wavefront measurement and correction accuracy and a method for using the same. Background technique [0002] The wavefront distortion seriously affects the quality of the laser beam. In order to eliminate the wavefront distortion, the wavefront measurement and correction technology based on the Hartmann wavefront sensor is widely used (Modeling and control of a deformable mirror, "Journal of Dynamic Systems, Measurement, and Control", Vol.124, 2002, 297-302.). The traditional wavefront correction system includes a set of deformable mirrors and high-voltage drivers, a set of wavefront sensors, and a set of control software. The measurement and correction of wavefront distortion are all based on the results of one experiment, and the wavefront measurement and correction effects are highly accurate. Difficult to guar...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01J9/00
CPCG01J9/00
Inventor 薛峤曾发张晓璐代万俊田晓琳梁樾李森宗兆玉赵军普邓武张崑龙蛟张君
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS