Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Light alignment method and system for improving Gamma passing rate

A photo-alignment, photosensitive monomer technology, applied in optics, nonlinear optics, instruments, etc., can solve the problems of photosensitive monomer reaction rate difference, short time, low optical Gamma pass rate, etc., to improve Gamma pass rate, improve Effect of Gamma Pass Rate

Active Publication Date: 2019-01-15
SUZHOU CHINA STAR OPTOELECTRONICS TECH CO LTD
View PDF11 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The first UV alignment requires a reaction temperature of 40 degrees or 50 degrees (different products vary), while the second UV alignment requires a temperature of 25 degrees at room temperature, from the first UV alignment to the second UV alignment The inter-process time is very short. According to the statistical data of 3 months, 56% are less than 2min, and 70% are less than 4min. In the process, the reaction rate of the photosensitive monomer is different due to the temperature difference, which is easy to cause the optical Gamma pass rate to be low.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Light alignment method and system for improving Gamma passing rate
  • Light alignment method and system for improving Gamma passing rate
  • Light alignment method and system for improving Gamma passing rate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0035] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments that the present application can be used to implement. The directional terms mentioned in this application, such as [top], [bottom], [front], [back], [left], [right], [inside], [outside], [side], etc., are for reference only The orientation of the attached schema. Therefore, the directional terms used are used to illustrate and understand the application, but not to limit the application. In the figures, structurally similar elements are denoted by the same reference numerals.

[0036] Such as figure 1 As shown, it is a flow chart of a photo-alignment method for improving the Gamma pass rate provided by the present application, and the method includes the following steps:

[0037] Step S 1. Apply a voltage to the liquid crystal panel to be aligned, and irradiate the liquid crystal panel with ultraviolet light for the first time, so that at the f...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a light alignment method and system for improving Gamma passing rate. The method comprises the following steps of: applying a voltage to the liquid crystal panel to be aligned,and carrying out the first ultraviolet irradiation on the liquid crystal panel, so that a photosensitive monomer moves to an alignment substrate to carry out polymerization reaction to form a polymerat the first preset temperature; cooling the liquid crystal panel to the second preset temperature in the preset time, wherein the preset time is set according to the Gamma passing rate; and finally,carrying out the second ultraviolet irradiation on the liquid crystal panel at the second preset temperature, so that the photosensitive monomer and the alignment substrate generate alignment films, and liquid crystal molecules are aligned at the preset angle.

Description

technical field [0001] The present application relates to the technical field of liquid crystal panel manufacturing, and in particular to an optical alignment method and system for improving Gamma pass rate. Background technique [0002] The HVA photo-alignment technology in liquid crystal display is to apply voltage to the liquid crystal panel filled with liquid crystal and irradiate with ultraviolet light, so that the photosensitive monomer (Monomer) doped in the liquid crystal molecules and the PI alignment substrate are polymerized. A polymer is formed, and due to the interaction between the polymer and the liquid crystal molecules, the liquid crystal molecules are aligned along the direction of the polymer molecules to form the required pre-tilt angle for display. [0003] The HVA process is mainly divided into two alignment processes. The first ultraviolet light alignment is to apply voltage to the liquid crystal panel and irradiate it with ultraviolet light at a certa...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1337
CPCG02F1/133788
Inventor 吴灵智
Owner SUZHOU CHINA STAR OPTOELECTRONICS TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com