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Optical alignment method and system for improving gamma pass rate

A photo-alignment, photosensitive monomer technology, applied in optics, nonlinear optics, instruments, etc., can solve the problems of photosensitive monomer reaction rate difference, short time, low optical Gamma pass rate, etc., to improve Gamma pass rate, improve Effect of Gamma Pass Rate

Active Publication Date: 2021-06-25
SUZHOU CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The first UV alignment requires a reaction temperature of 40 degrees or 50 degrees (different products vary), while the second UV alignment requires a temperature of 25 degrees at room temperature, from the first UV alignment to the second UV alignment The inter-process time is very short. According to the statistical data of 3 months, 56% are less than 2min, and 70% are less than 4min. In the process, the reaction rate of the photosensitive monomer is different due to the temperature difference, which is easy to cause the optical Gamma pass rate to be low.

Method used

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  • Optical alignment method and system for improving gamma pass rate
  • Optical alignment method and system for improving gamma pass rate
  • Optical alignment method and system for improving gamma pass rate

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Embodiment Construction

[0035] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments that the present application can be used to implement. The directional terms mentioned in this application, such as [top], [bottom], [front], [back], [left], [right], [inside], [outside], [side], etc., are for reference only The orientation of the attached schema. Therefore, the directional terms used are used to illustrate and understand the application, but not to limit the application. In the figures, structurally similar elements are denoted by the same reference numerals.

[0036] Such as figure 1 As shown, it is a flow chart of a photo-alignment method for improving the Gamma pass rate provided by the present application, and the method includes the following steps:

[0037] Step S 1. Apply a voltage to the liquid crystal panel to be aligned, and irradiate the liquid crystal panel with ultraviolet light for the first time, so that at the f...

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Abstract

The present application provides a photo-alignment method and system for improving the Gamma pass rate. The method includes the following steps: firstly applying a voltage to the liquid crystal panel to be aligned, and irradiating the liquid crystal panel with ultraviolet light for the first time, so that in the first preliminary At a set temperature, the photosensitive monomer moves to the alignment substrate, and a polymerization reaction occurs to form a polymer; and then the liquid crystal panel is cooled to a second preset temperature within a preset time, wherein the preset time is passed according to Gamma Finally, at the second preset temperature, the liquid crystal panel is irradiated with ultraviolet rays for the second time, so that the photosensitive monomer and the alignment substrate form an alignment film, so that the liquid crystal molecules are in a preset Angular alignment.

Description

technical field [0001] The present application relates to the technical field of liquid crystal panel manufacturing, and in particular to an optical alignment method and system for improving Gamma pass rate. Background technique [0002] The HVA photo-alignment technology in liquid crystal display is to apply voltage to the liquid crystal panel filled with liquid crystal and irradiate with ultraviolet light, so that the photosensitive monomer (Monomer) doped in the liquid crystal molecules and the PI alignment substrate are polymerized. A polymer is formed, and due to the interaction between the polymer and the liquid crystal molecules, the liquid crystal molecules are aligned along the direction of the polymer molecules to form the required pre-tilt angle for display. [0003] The HVA process is mainly divided into two alignment processes. The first ultraviolet light alignment is to apply voltage to the liquid crystal panel and irradiate it with ultraviolet light at a certa...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/1337
CPCG02F1/133788
Inventor 吴灵智
Owner SUZHOU CHINA STAR OPTOELECTRONICS TECH CO LTD
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