Spectral measurement device under high pressure condition
A spectral measurement and high-pressure technology, applied in the field of material research, can solve problems such as difficult Raman scattering spectroscopy, uneven pressure distribution, anvil pressure deviation, etc., and achieve the goals of reducing local heat, high spatial separation, and avoiding pressure deviation Effect
Pending Publication Date: 2019-02-15
JINHUA VOCATIONAL TECH COLLEGE
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Problems solved by technology
However, the devices of the prior art also have the following defects. The first defect of the prior art is that some special materials with opaque and weaker scattering signals in the prior art are difficult to obtain a clear Raman scattering spectrum, especially the spectral range and anvil material Materials with overlapping ranges of one-photon and two-photon Raman scattering spectra
Defect 2 of the existing technology: The high-pressure spectroscopy measurement in the prior art usually uses a support table combined with a diamond anvil, and the support table is pressed along a fixed guide rail to apply pressure to the sample. The relaxation of the guide rail will cause a small deviation in displacement. And because the pressure distribution of the support table on the bottom surface of the anvil is uneven, thereby causing the pressure deviation between the anvils, the spectral measurement device under the high-pressure condition can solve the problem
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[0024] Such as figure 1 is a schematic diagram of the present invention, such as figure 2 It is a top view diagram of the upper pressure plate, including the upper pressure plate (1), the lower pressure plate (2), the leveling screw (3), the pressure screw (4), the anvil limit screw (5), and the upper support plate (6) , lower support plate (7), upper anvil (8), lower anvil (9), ring gasket (10), pressure medium (11), sample (12), limit screw (13), light collection system ( 14) and laser (15), xyz is a three-dimensional space coordinate system, and the upper pressure plate (1) and the lower pressure plate (2) are all steel rings with an outer diameter of ten centimeters and have elasticity, and the upper pressure plate (1 ) and the lower pressure plate (2) are arranged coaxially in the vertical y direction, and the upper pressure plate (1) has three evenly distributed M5 screw holes on the circumference three centimeters away from the center, and the upper pressure plate (1)...
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The invention relates to the field of material researches, and a spectral measurement device under a high pressure condition. The spectral measurement device comprises upper pressure plates, lower pressure plates, leveling screws, pressure screws, anvil limit screws, upper support plates, lower support plates, an upper anvil, a lower anvil, a circular gasket, a pressure medium, a sample, limit screws, a light collection system and a laser device. Spectral characteristics of a sample can be researched under the high pressure condition, and a signal of an anvil material can be suppressed as muchas possible, so that incident light and reflected light of the surface of the sample respectively enter and leave the top anvils through diagonal planes of the crown parts of the anvils; the incidentlight is incident from the diagonal plane of the crown part of the diamond anvil and has a relatively large incident angle on the surface of the sample, so that scattered light and fluorescence of the diamond can be better separated from scattered light of the sample; pressure devices do not need guide rail structures, so that a pressure deviation caused by looseness of the components is avoided;laser is not required to be focused onto a very small region on the sample, so that local heat on the surface of the sample due to the laser can be reduced.
Description
technical field [0001] The invention relates to the field of material research, in particular to a spectrum measuring device under high pressure conditions for studying the spectral characteristics of samples under high pressure conditions. Background technique [0002] It is of great significance to study the change of some properties of materials with the applied pressure. High-pressure spectroscopic measurement technology is a typical research method, such as inelastic scattering technology of visible light including Raman scattering, which is very suitable for studying the effect of material properties on photons The dependence of energy, magnetic interaction, plasma energy, electronic band structure and superconducting energy gap is usually applied to the material sample to be tested by using a pressure applying device such as an anvil, and the material is measured in combination with spectroscopic technology. In particular, high pressure light scattering technology is ...
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IPC IPC(8): G01N21/25G01N21/47G01N21/01
CPCG01N21/01G01N21/25G01N21/47
Inventor张向平方晓华赵永建
OwnerJINHUA VOCATIONAL TECH COLLEGE