Photomask for manufacturing active switch and manufacturing method of display panel

A switching and active technology, which is applied in the direction of photo-plate-making process of originals, optics, and patterned surface for photomechanical processing, so as to reduce out-of-focus phenomenon and improve process yield.

Active Publication Date: 2019-02-15
HKC CORP LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is to provide a method for making a photomask and a display panel for an active switch that can alleviate the problem of out-of-focus during exposure at the channel

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  • Photomask for manufacturing active switch and manufacturing method of display panel
  • Photomask for manufacturing active switch and manufacturing method of display panel
  • Photomask for manufacturing active switch and manufacturing method of display panel

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Embodiment Construction

[0038] It should be understood that the terminology and specific structural and functional details disclosed herein are representative only for describing specific embodiments, but the application can be embodied in many alternative forms and should not be construed as merely Be limited by the examples set forth herein.

[0039] In the description of the present application, the terms "first" and "second" are used for descriptive purposes only, and cannot be understood as indicating relative importance, or implicitly indicating the quantity of indicated technical features. Therefore, unless otherwise specified, the features defined as "first" and "second" may explicitly or implicitly include one or more of these features; "plurality" means two or more. The term "comprising" and any variations thereof mean non-exclusive inclusion, possible presence or addition of one or more other features, integers, steps, operations, units, components and / or combinations thereof.

[0040] Al...

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Abstract

The invention discloses a photomask for manufacturing an active switch and a manufacturing method of a display panel. The phhotomask comprises a light shielding area which corresponds to a metal layerof the active switch and is configured to be opaque; a semi-transmissive area which corresponds to a channel area of the active switch and is configured to be partially transparent; a light transmissive region which serves as a mask area other than the light shielding area and the semi-transmissive area and is configured to be completely transparent; and a hollowed area which is located in the semi-transmissive area and configured to be completely transparent. According to the photomask, the hollowed area is arranged on the semi-transparent area, and the hollowed area can increase the light transmission amount of the semi-transmissive area, thereby reducing a defocusing phenomenon during exposure and improving the process yield.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a method for making a photomask for making an active switch and a display panel. Background technique [0002] The four-process process is commonly used in the production of display panels. Its function is to combine the amorphous silicon layer and the data line or the source-drain metal layer into a photomask. Compared with the traditional five-process process, it reduces one photolithography process. Can improve production efficiency. Each mask process in the four-process process will go through the steps of exposure, development, etching, and photoresist stripping; in the actual production process, because the light has a certain scattering effect, it will affect the exposure quality of the active switch. [0003] The arc-shaped channel region of the active switch is out of focus during exposure. Contents of the invention [0004] The technical problem to be solved by the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/54G03F1/00
CPCG03F1/00G03F1/54G03F1/50G03F1/38H01L27/1288H01L29/41733
Inventor 吴川
Owner HKC CORP LTD
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