Reticle stage system and lithography machine

Abstract

The invention discloses a reticle stage system. The reticle stage system is installed in a lithography machine by a hanging frame, and comprises a reticle stage, a reticle stage base, a reticle stagedriving unit, a motion control unit and a buffer mechanism, wherein the buffer mechanism is fixed on the hanging frame and connected with the reticle stage base for weakening a driving counter-force acting on the reticle stage base and resulting from driving of the reticle stage by the reticle stage driving unit. According to the invention, the vibration of the reticle stage caused by the drivingcounter-force can be effectively reduced via the mechanical vibration damping of the buffer mechanism and the system compensation control of the motion control unit, so the motion precision and stability of the reticle stage are improved; and thus, the vibration damping performance and dynamic performance of the whole lithography machine are enhanced, the overlay and line width indexes of lithographic equipment are maintained, and the accuracy and stability of equipment are ensured. The reticle stage system of the invention also has the advantages of light mass, small size, reliable structureand the like.

Description

technical field [0001] The present invention relates to the technical field of photolithography, in particular to a mask stage system and a photolithography machine including the mask stage system. Background technique [0002] Photolithography is a very important process in the semiconductor manufacturing process. It is a process of sequentially transferring chip patterns on a series of reticles to corresponding layers of silicon wafers through exposure. It is considered to be the core step in large-scale integrated circuit manufacturing. . A series of complex and time-consuming photolithography processes in semiconductor manufacturing are mainly completed by corresponding photolithography machines. [0003] A photolithography machine is a device that images a mask pattern on a target substrate through a photolithography apparatus in which a mask stage moves with nanometer-scale precision. With the improvement of productivity, the size of the substrate of the lithography ...

AI Technical Summary

Problems solved by technology

The balanced mass method is based on the principle of momentum conservation, and uses the balanced mass to offset the motor drive reaction force, which can theoretically eliminate the disturbance transmitted to the frame, but it is difficult to implement due to its large mass and volume; the counter force external introduction method uses a special mechanism to drive the motor The reaction force acts on the external world to reduce the interference to the internal world, but it is necessary to build a very high reaction force external support to connect the ground and the external reaction force mechanism, and the increase in the length of the support leads to weakened stiffness, which is difficult to meet the actual production demand

Images