Apparatus and method for ion beam etching and sputtering protection

Abstract

The invention relates to a device and method applied to ion beam etching and sputtering protection. The device mainly includes a cylindrical shielding tube on a front support and a base support. The device is placed in the hatch of the vacuum chamber as a whole, directly in front of the workpiece table, and the position of the cylindrical shielding cylinder can be adjusted through the base bracket and the front bracket so that it is at the same level as the thrust plate of the workpiece table. After the thrust plate is installed on the target position of the workpiece table, the thrust plate is protected from sputtering, thereby reducing the depth tolerance of the etched thrust plate caused by ion sputtering during ion beam etching, which meets the requirements of the gyro instrument accuracy requirements.

Description

technical field [0001] The present invention relates to the technical field of ion beam etching, in particular to a device and method for ion beam etching sputtering protection, the main purpose of which is to reduce the etching thrust caused by ion sputtering in the ion beam etching process The depth of the plate groove is out of tolerance. Background technique [0002] The gyroscope uses a dynamic pressure air bearing motor, and the motor thrust plate is a key part of the thrust bearing. The uniformity of the groove depth of the spiral groove is an important parameter to realize an effective air bearing, which directly affects the support performance and operation stability of the motor. At present, the helical groove of the thrust plate of the gyroscope motor is processed by ion beam etching. [0003] The essence of ion beam etching is a processing method in which high-energy ion flow hits the surface of the part, and the atoms hit by the hit are separated from the body ...

AI Technical Summary

Problems solved by technology

After the ion flow enters the vacuum chamber, most of it is directly shot at the target material of the workpiece table, and has a frontal impact on the thrust plate on the workpiece table, but some of the ion flow will splash in the vacuum chamber in a disordered state, and finally from Impacting the thrust plate at different angles, due to the disordered and irregular impact angle and speed, is the biggest factor causing the depth of the etched groove of the thrust plate to be out of tolerance and poor in uniformity

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