Vertical multi-junction structure molybdenum disulfide solar cell and preparation method thereof
A solar cell and molybdenum disulfide technology, which is applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of high cost of solar cell power generation, low voltage of single-chip battery power generation, and large amount of materials used, so as to reduce the amount of materials used , reduce optical loss, and absorb efficiently
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Embodiment 1
[0036] Such as figure 1 and figure 2 As shown, the present invention provides a vertical multi-junction molybdenum disulfide solar cell structure, which includes three parts: a periodically repeated basic unit, doped regions on both sides and electrodes on both sides:
[0037] The basic units that repeat periodically include:
[0038] The base region (0) is a single-layer molybdenum disulfide material, which is an intrinsic semiconductor;
[0039] The first doped region (1) is a single-layer molybdenum disulfide material, and the first doped region (1) is made on one side of the base region (0), and its thickness is the same as that of the base region (0), which is P-type doping, doped with F atoms and O atoms;
[0040] The second doped region (2) is a single-layer molybdenum disulfide material, the second doped region (2) is made on the other side of the base region (0), and its thickness is the same as that of the base region (0), It is N-type doped, and the doped is P ...
Embodiment 2
[0056] Such as figure 1 and figure 2 As shown, the present invention provides a vertical multi-junction molybdenum disulfide solar cell structure, which includes three parts: a periodically repeated basic unit, doped regions on both sides and electrodes on both sides:
[0057] The basic units that repeat periodically include:
[0058] The base area (0) is a 10-layer molybdenum disulfide material, which is an intrinsic semiconductor;
[0059] The first doped region (1) is a 10-layer molybdenum disulfide material, and the first doped region (1) is made on one side of the base region (0), and its thickness is the same as that of the base region (0), which is P-type doping, doped with AuCl 3 ;
[0060] The second doped region (2) is 10 layers of molybdenum disulfide material, and the second doped region (2) is made on the other side of the base region (0), and its thickness is the same as that of the base region (0), It is N-type doped, and the doped is BV;
[0061] Adjacen...
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