Anti-weft oblique processing method for denim fabric with bamboo joint effect

Abstract

The invention belongs to the field of fabric processing, and particularly relates to an anti-weft oblique processing method for a denim fabric with a bamboo joint effect. The adopted specific technical scheme is that the anti-weft oblique processing method for the fabric comprises the step of covering the non-processed surface of the fabric with a film for protecting, wherein the film is an easy-tearing film; and the stretchability of the film is lower than the stretchability of the fabric. According to the anti-weft oblique processing method for the denim fabric with the bamboo joint effect,starting with the source of weft oblique, first, the fabric is covered with the film and is shaped creatively, and then, subsequent printing processing is performed; and a new idea is provided for avoiding the weft oblique of the fabric. The invention also provides the easy-tearing film which can be attached to a relatively rough surface, such as the fabric; the ductility and the stretchability ofthe protective film are poor, so that the protective film cannot deform in an external force process, such as printing, and reliable support is provided for the fabric; meanwhile, the protective filmis easy to remove after being used; sticky residue is avoided after the protective film is removed; and the character of the fabric cannot be affected.

Description

technical field [0001] The invention belongs to the field of fabric processing, and in particular relates to a fabric anti-weft oblique processing method with thick twill and slub effect. Background technique [0002] During the printing process, due to the continuous traction of the fabric and the influence of various mechanical movements and production operations, the weft yarn is prone to be skewed or distorted, that is, the weft is skewed, resulting in the final processed finished pattern not being parallel to the edge of the fabric, affecting The quality of the fabric needs to be cut flat when using it, resulting in a lot of waste. [0003] Most of the existing weft adjusting devices are photoelectric weft adjusting devices. There are four sets of sensors on the photoelectric weft adjusting device. Each set of sensors includes two parts: light-emitting and light-sensitive. The weft skew of the cloth can be measured through the photoelectric effect. The action adjustmen...

AI Technical Summary

Problems solved by technology

[0004] The photoelectric weft adjustment device can indeed completely avoid the occurrence of weft skew defects for fabrics that are prone to produce interference fringes that can be seen in light, but for denim fabrics and slub yarns with slub effects in the weft direction, irregular draft yarns, dancers, etc. Special silk fabrics such as dragon silk will inevitably produce detection blind spots; on the one hand, denim fabrics are not easy to produce light interference effects, even if interference effects are produced, the effect is not very ideal, and the conversion of images into electrical pulse signals is not strong enough , so that the detection of weft inclination becomes a blind spot; on the other hand, due to the use of special silk yarns such as slub yarns with slub effects, irregular draft yarns, and dragon dance yarns in the weft direction of some fabrics, the slub effect yarns, Irregular draft yarn, dragon dance yarn and other special yarns are detected as false images, so that the adjustment of weft skew takes the slub effect yarn as the adjustment object, thus becoming a blind spot in the real sense. Skew state

Therefore, for this kind of fabric, the traditional weft adjustment device does not play a big role, and a new method of preventing weft skew is urgently needed

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