23 results about "Seismic mass" patented technology

A microelectromechanical sensor component. The component includes: a substrate; a movable sensor structure connected to the substrate and having a seismic mass portion and a deflection electrode arranged thereon; and at least one evaluation electrode arranged on the substrate. The deflection electrode is arranged so as to be movable relative to the evaluation electrode. The evaluation electrode is configured for capacitive detection of a deflection of the deflection electrode. The deflection electrode and the evaluation electrode form a comb structure. The deflection electrode has a plurality of deflection electrode fingers extending from a deflection electrode bar in the direction of the evaluation electrode. The evaluation electrode has a plurality of evaluation electrode fingers extending, parallel at least in portions to the deflection electrode fingers, from an evaluation electrode bar in the direction of the deflection electrode.

Method for the precise measurement operation of a micromechanical angular rate sensor, comprising at least one deflectably suspended seismic mass (1, 15, 20), at least one drive device for driving the seismic mass (1, 15, 20) and at least one first (2, 11, 18) and one second (3, 12, 19) trim electrode element, which are directly or indirectly jointly assigned to the seismic mass (1, 15, 20), wherein a first electrical trim voltage (U) is applied between the first trim electrode element (2, 11, 18) and the seismic mass (1, 15, 20). TO1 , U TLO1 , U TRO1 , U TU2 , U T1H , U T2V ) and a second electrical trim voltage (U) between the second trim electrode element (3, 12, 19) and the seismic mass (1, 15, 20) TO2 , U TLO2 , U TRO2 , U TU1 , U T2H , U T1V) are set, whereby the first and second electrical trim voltages depend at least on a quadrature parameter (U). T ) and a resonance parameter (U f ) are set, characterized by the fact that the first (U TO1 , U TLO1 , U TRO1 , U TU2 , U T1H , U T2V ) and the second (U TO2 , U TLO2 , U TRO2 , U TU1 , U T2H , U T1V ) electrical trim voltage is set so that the sum of the square of the first electrical trim voltage (U) TO1 , U TLO1 , U TRO1 , U TU2 , U T1H , U T2V ) multiplied by a first constant factor (α) and from the square of the second electrical trim voltage (U) TO2 , U TLO2 , U TRO2 , U TU1 , U T2H , U T1V) multiplied by a second constant factor (β), is kept constant and / or is based on a first reference value of the resonance parameter (U) f ) is set to the square.

A sensor system having a MEMS gyroscope is claimed, the sensor system comprising at least: - a seismic mass which can be excited to oscillate, the seismic mass having at least one electrode assembly for capacitively detecting a measurement signal, - a drive circuit for generating a drive voltage for exciting and maintaining a defined oscillatory motion of the seismic mass, wherein a parasitic capacitive coupling exists between the drive circuit and the at least one electrode assembly, - a detection circuit for reading the measurement signal and for generating a rotation rate signal on the basis of the measurement signal, characterized by circuit means for compensating for an offset of the rotation rate signal from the drive voltage.

A microelectromechanical sensor (100) is described comprising a substrate (110), a stationary electrode arrangement (120) relative to the substrate (110) with several stationary finger electrodes (122, 124) arranged one behind the other in a detection direction (y), and a mass arrangement (130) with a first seismic mass (140) that is elastically deflectable relative to the substrate (110) in the detection direction (y) and that comprises a first movable electrode arrangement (150) of several movable finger electrodes (151), and a second seismic mass (160) that is elastically deflectable relative to the substrate (110) in the detection direction (y) and that comprises a second movable electrode arrangement (170) of several movable finger electrodes (171). wherein the finger electrodes (151) of the first movable electrode arrangement (150) and the finger electrodes (171) of the second movable electrode arrangement (170) are each alternately in combing engagement with the finger electrodes (122, 124) of the stationary electrode arrangement (120), wherein the mass arrangement (130) further comprises a coupling device (180) mechanically connecting the first seismic mass (140) with the second seismic mass (160) in a manner capable of movement, which is configured to cause a deflection of the first seismic mass (140) in a corresponding deflection of the second seismic mass (160) in the respective opposite direction.

A three-axis yaw rate sensor. The sensor includes a sensor substrate, a double rotor, and a first and a second spring structure, the substrate having a main extension plane, the main extension plane being spanned by an X-axis and a Y-axis oriented perpendicularly to the X-axis, a Z-axis being oriented perpendicularly to the main extension plane, the double rotor having a first and a second rotor, the first rotor having a first and a second seismic mass, the second rotor having a third and fourth seismic mass, the first rotor being connected to the sensor substrate via a first substrate connection, the second rotor being connected to the sensor substrate via a second substrate connection, the first rotor being connected to the second rotor via the first spring structure in such a way that a first mechanical coupling is present between the first and the second rotor.

The invention relates to a micromechanical component for an opto-mechanical sensor device with a seismic mass (14) which is attached to a holder (10) such that the seismic mass (14) is adjustable at least in a first spatial direction (x), wherein the micromechanical component has a first Mach-Zehnder interference structure (18) with a first beam path (20a) extending along a second spatial direction (y) and a second beam path (20b) extending along the second spatial direction (y), and wherein the first beam path (20a) is located on a first side of the second beam path (20b) in the first spatial direction (x) and the seismic mass (14) is located on a second side of the second beam path (20b) in the first spatial direction (x).that a phase difference (ΔΦ) between a first partial beam transmitted through the first beam path (20a) and a second partial beam transmitted through the second beam path (20b) can be varied by means of the seismic mass (14) adjusted along the first spatial direction (x).

An acceleration-measuring sensor assembly includes an accelerometer subassembly with three measurement axes, mounted in a housing equipped with securing elements, and configured to determine an acceleration along a principal axis A, the assembly comprising: a single-axis principal accelerometer with a seismic mass moving in a straight line along a principal axis A, measuring acceleration along the principal axis A which is misaligned with respect to a reference axis Y by at most 50 mrad, a secondary accelerometer having at least two measurement axes and measuring respectively along two axes X and Z which with the reference axis Y form a direct orthonormal trihedron (O, X, Y, Z), the measurement precision of the two-axis accelerometer along each of its axes being at least ten times inferior to the measurement precision of the single-axis accelerometer, and an electronic processing unit configured to calculate a compensated acceleration S.

A rotation rate sensor and a method for operating a rotation rate sensor with a substrate and a double rotor are proposed, wherein the substrate has a principal extension plane with an X-direction and a Y-direction perpendicular to it, wherein the double rotor has a first rotor and a second rotor, each elastically connected to the substrate via a suspension by means of one of the first spring elements and elastically connected to each other such that the two rotors can be excited to antiphase rotational oscillations, wherein the axes of rotation of the rotors each run parallel to a Z-direction perpendicular to the principal extension plane of the substrate, wherein the first rotor is elastically connected to a first seismic mass and a second seismic mass, and wherein the second rotor is elastically connected to a third seismic mass and a fourth seismic mass.wherein the first seismic mass is connected to the third seismic mass via a first rocker element by means of one of the fourth spring elements, wherein the second seismic mass is connected to the fourth seismic mass via a second rocker element by means of another of the fourth spring elements, wherein each of the first spring elements has a first spring constant in the Y-direction, and wherein each of the fourth spring elements has a fourth spring constant in the Y-direction.

A microelectromechanical sensor component. The microelectromechanical sensor component includes a substrate; a seismic mass connected to the substrate and movable relative to the substrate via a suspension spring, wherein the seismic mass can be deflected in a deflection direction extending perpendicular to the substrate surface; an evaluation electrode arranged between the substrate and the seismic mass for capacitively detecting a deflection of the seismic mass and providing a capacitive useful signal; and a reference electrode having a plurality of reference electrode portions which form a reference electrode frame surrounding the seismic mass at least in portions. The reference electrode is anchored to the substrate by at least two attachment points and each reference electrode portion in a self-supporting manner between two attachment points. A reference counter electrode is arranged between the substrate and the reference electrode for providing a capacitive reference signal in cooperation with the reference electrode.

An operating device for a rotation-rate sensor. A mechanical amplification of a deflection oscillatory motion and / or a phase shift of the deflection oscillatory motion relative to a harmonic drive oscillation of a seismic mass can be determined using an electronic apparatus of the operating device by taking into account at least one drive frequency variable with respect to a characteristic drive frequency of the harmonic drive oscillation of the seismic mass of the rotation-rate sensor and by also taking into account at least one detection frequency variable, which is provided by the operating device itself to the operating device, with respect to a characteristic detection frequency of the deflection oscillatory motion, caused by a Coriolis force, of the seismic mass put into the harmonic drive oscillation or with respect to a difference between the characteristic drive frequency and the characteristic detection frequency.

The present invention relates to an accelerometer comprising a support (2), a seismic mass (1) associated with an acceleration sensor having at least one acceleration sensitivity axis (A), the seismic mass (1) being subject to forces resulting from the acceleration to be measured and static forces (such as gravity or inertial forces), and an elastically deformable connecting device (3) connecting the seismic mass (1) to the support (2). The accelerometer also comprises a fixed stop system (5), a movable stop device (34) attached to or forming part of the elastically deformable connecting device (3), and a movement system (4) configured to move the movable stop device (34) relative to the fixed stop system (5) to elastically deform the elastically deformable connecting device (3) in order to apply a restoring force (FR) to the seismic mass (1).

An operator device for a capacitive sensor. The device includes an electronic device, by means of which an actual gap distance between the seismic mass and the at least one electrode and / or an actual variable for a sensitivity of the capacitive sensor can be determined, taking into account at least a first constant voltage, a first natural frequency of a first harmonic vibration of a seismic mass along a spatial direction, centrally intersecting the seismic mass and the at least one electrode, when the first constant voltage is applied between the seismic mass and the at least one electrode, a second constant voltage and a second natural frequency of a second harmonic vibration of the seismic mass along the spatial direction, centrally intersecting the seismic mass and the at least one electrode, when the second constant voltage is applied between the seismic mass and the at least one electrode.

The utility model relates to the technical field of hydraulic engineering, and particularly discloses concrete anti-seismic quality detection equipment which comprises a vibration detection main body, a vibration table is movably mounted at the upper end of the vibration detection main body, and a fixing mechanism for clamping and limiting concrete samples of different specifications is arranged on the vibration table. The fixing mechanism comprises a lifting assembly and a clamping assembly which are arranged on the vibration table, a through sinking table is longitudinally formed in the upper end of the vibration table, the lifting assembly comprises a containing plate arranged in the sinking table, a hydraulic cylinder connected with the containing plate is fixedly installed at the lower end of the vibration table, and the clamping assembly comprises an adjusting assembly arranged at the upper end of the vibration table. Through the arrangement of the fixing mechanism on the vibration table, the lifting assembly is used for placing and supporting a concrete sample, and is matched with a sliding frame on the adjusting assembly for adjustment, so that a three-way limiting seat is used for fitting and limiting the corner part of the upper end of the concrete sample, and complete positioning of the concrete sample is realized; the vibration stability of the concrete sample along with the whole vibration table is ensured.

A three-axis gyroscope comprising a sensor substrate, a rotor having a central mass, a drive, a coupling frame, and detection electrodes, wherein the sensor substrate has a principal extension plane, the principal extension plane being spanned by an X-axis and a Y-axis oriented perpendicular to the X-axis, and a Z-axis being oriented perpendicular to the principal extension plane, wherein the rotor has a first and a second seismic mass, wherein the rotor is connected to a substrate connection via a first spring assembly, the substrate connection being connected to the sensor substrate, and wherein the first and the second seismic masses are connected to the central mass via a second spring assembly.

A rotation rate sensor and a method for operating a rotation rate sensor having a substrate and a double rotor are proposed, the substrate having a main plane of extent with an X direction and a Y direction running perpendicular thereto, the double rotor having a first rotor and a second rotor which are each elastically connected to the substrate via a suspension by means of one of first spring elements and are elastically connected to one another in such a way that the two rotors can be excited to anti-phase rotary oscillations, the axes of rotation of the rotors each running parallel to a Z direction perpendicular to the main plane of extent of the substrate, the first rotor being elastically connected to a first seismic mass and a second seismic mass, the second rotor being elastically connected to a third seismic mass and a fourth seismic mass, the first seismic mass being connected to the third seismic mass via a first rocker element in each case by means of one of fourth spring elements, the second seismic mass being connected to the fourth seismic mass via a second rocker element in each case by means of another one of the fourth spring elements, each of the first spring elements having a first spring constant in the Y direction, each of the fourth spring elements having a fourth spring constant in the Y direction.

The invention relates to a micromechanical component for a sensor device, having a first seismic mass (30a), wherein the first seismic mass, which is displaceable from its first rest position in a first direction (44) over a first limit path along a first axis, mechanically contacts a first stop structure, and having a second seismic mass (30b), which is displaceable from its second rest position at least along a second axis, wherein the second axis is parallel to or lies on the first axis, wherein a second stop surface (50b) of the second seismic mass, which is displaceable from its second rest position in a second direction (46) which is oriented opposite to the first direction along the second axis, mechanically contacts a first stop surface (50a) of the first seismic mass which is attached to the first stop structure. The invention also relates to a method for producing a micromechanical component for a sensor device.

The invention relates to a microelectromechanical sensor component (1) comprising a substrate (2), a movable sensor structure (3) connected to the substrate (2) with a seismic mass section (4) and a deflection electrode (5) arranged thereon, and at least one evaluation electrode (6) arranged on the substrate (2), to which the deflection electrode (5) of the movable sensor structure (3) is arranged to be movable relative, wherein the evaluation electrode (6) is configured to capacitively detect a deflection of the deflection electrode (5), wherein the deflection electrode (5) and the evaluation electrode (6) form a comb structure.The invention relates to a deflection electrode (5) comprising a plurality of deflection electrode fingers (5b) extending from a deflection electrode bar (5a) towards the evaluation electrode (6), and to an evaluation electrode (6) comprising a plurality of evaluation electrode fingers (6b) extending from an evaluation electrode bar (6a) towards the deflection electrode (5) at least sectionally parallel to the deflection electrode fingers (5b). The invention further relates to a microelectromechanical inertial sensor (20) with such a microelectromechanical sensor component (1).

A sensor for parallel measurement of pressure and acceleration of a vehicle, including a substrate, a sensor element disposed on the substrate, a material being connected with the sensor element and being exposed to the environment of the sensor, wherein the material is configured to act as a seismic mass, and an electronic circuitry connected with the sensor element and including a first filter and a second filter, wherein the first and second filters have different filter characteristics so that an output of the first filter is representative for the pressure and an output of the second is representative for the acceleration.

The invention relates to a microelectromechanical sensor component (1), comprising: a substrate (2) having a substrate surface (2a); a seismic mass (4) connected to the substrate (2) and movable relative to the substrate (2) by means of suspension springs (3), the seismic mass being deflectable in a deflection direction (A) running perpendicular to the substrate surface (2a); and an evaluation electrode (5) arranged between the substrate and the seismic mass for capacitively detecting a deflection of the seismic mass (4) and providing a capacitive useful signal, the microelectromechanical sensor component (1) further comprising a reference electrode (6) having a plurality of reference electrode segments (6a), which form a reference electrode frame (6b) surrounding the seismic mass (4) at least in some sections, the reference electrode (6) is anchored on the substrate (2) via at least two connection points (7), and a respective reference electrode section (6a) extends overhanging between the two connection points (7); and a reference counter electrode (9) arranged between the substrate (2) and the reference electrode (6) for interacting with the reference electrode to provide a capacitive reference signal. The invention also relates to a micro-electromechanical inertial sensor (20) having such a micro-electromechanical sensor component.

Sensor structure (1) comprising a substrate (2) having a principal extension plane (100), a first seismic mass (10) and a second seismic mass (20), wherein the first and the second seismic mass (10, 20) are deflectable relative to the substrate (2) along a deflection direction (101) substantially perpendicular to the principal extension plane (100), wherein the first and the second seismic mass (10, 20) are coupled to each other via a rigid coupling rocker (30) pivotable about a rocker axis (31) parallel to the principal extension plane (100), wherein the first seismic mass (10) is suspended from the substrate (2) by means of a first suspension spring (11), characterized in that the sensor structure (1) comprises a substantially rigid first coupling beam (12) which is located between the first suspension spring (11) and the first seismic mass (10) is arranged.

Sensor arrangement (1) comprising a substrate (2) having a principal extension plane (100), a seismic mass (3) and at least one at least partially cantilevered electrode (4), wherein the seismic mass (3) is movably attached to the substrate (2) in a suspension area (5) about a torsion axis (6) parallel to the principal extension plane (100) and wherein the seismic mass (3) has an asymmetric mass distribution with respect to the torsion axis (6) and the electrode (4) is connected to the substrate (2) in a connection area (7), wherein a surface of the seismic mass (3) facing the substrate (2) is symmetrical with respect to the torsion axis (6) and the connection area (7) is arranged perpendicular to the torsion axis (6) and parallel to the principal extension plane (100) in the area of ​​the suspension area (5) or immediately adjacent to the suspension area (5).

The invention relates to a microelectromechanical sensor component (1) comprising a substrate (2) with a substrate surface (2a), a seismic mass (4) connected to the substrate (2) and movable relative to the substrate (2) via a suspension spring (3), wherein the seismic mass (4) is deflectable in a deflection direction (A) perpendicular to the substrate surface (2a), and an evaluation electrode (5) arranged between the substrate (2) and the seismic mass (4) for capacitively detecting a deflection of the seismic mass (4) and providing a capacitive useful signal, wherein the microelectromechanical sensor component (1) further comprises a reference electrode (6) with several reference electrode sections (6a) forming a reference electrode frame (6b) that at least partially surrounds the seismic mass (4).wherein the reference electrode (6) is anchored to the substrate (2) by at least two attachment points (7) and a reference electrode section (6a) extends freely between each of the two attachment points (7), and comprises a reference counter electrode (9) arranged between the substrate (2) and the reference electrode (6) for providing a capacitive reference signal in conjunction with the reference electrode (6). The invention further relates to a microelectromechanical inertial sensor (20) with such a microelectromechanical sensor component (1).

A three-axis gyroscope comprising a sensor substrate, a dual rotor, and a first and second spring assembly, wherein the substrate has a principal extension plane, the principal extension plane being spanned by an X-axis and a Y-axis oriented perpendicular to the X-axis, and a Z-axis being oriented perpendicular to the principal extension plane, wherein the dual rotor comprises a first and a second rotor, the first rotor comprising a first and a second seismic mass, and the second rotor comprising a third and a fourth seismic mass, wherein the first rotor is connected to the sensor substrate via a first substrate connection, and wherein the second rotor is connected to the sensor substrate via a second substrate connection, and wherein the first rotor is connected to the second rotor via the first spring assembly such that a first mechanical coupling exists between the first and the second rotor.wherein the seismic masses of the first and second rotors are connected to each other via the second spring structure in such a way that a second mechanical coupling exists between the seismic masses of the first and second rotors and between the first rotor and the second rotor.