Device for catalytic degradation of organic contaminants by using Ga2O3 thin film
A technology for organic pollutants and catalytic degradation, which is applied in the field of devices for catalytic degradation of organic pollutants using Ga2O3 films, and can solve the problems of non-reusable, difficult to recycle, and limited promotion.
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[0014] The present invention will be described in detail below in conjunction with the accompanying drawings. However, the present invention is not limited to the following examples.
[0015] Because the present invention focuses on Ga 2 o 3 The innovation of the shape of the material to achieve the purpose of reuse, so the Ga 2 o 3 The control of the growth conditions of thin film materials can be determined according to the specific experimental conditions of each researcher.
[0016] (1) A 15mm×15mm quartz plate is used as Ga 2 o 3 For the substrate for thin film growth, the substrate was ultrasonically cleaned with acetone, ethanol, and deionized water in sequence, and then dried with a nitrogen gun for later use.
[0017] (2) Using radio frequency magnetron sputtering equipment to deposit a layer of Ga on the quartz substrate 2 o 3 film material. The pre-vacuum degree of the system is 5×10 -4 Pa. The film growth atmosphere is Ar, and the working pressure is 1.0...
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