Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Multi-exposure image fusion method

An image fusion and multi-exposure technology, which is applied in the field of image processing, can solve the problems of whitening, blurring, and failure to obtain good results, etc., and achieve the effect of enhancing details and preventing whitening or blurring

Inactive Publication Date: 2019-04-16
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
View PDF5 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the weight calculation of each exposure image is the mean value of the original image as the center value, and the weights are obtained by comparing multiple exposure images with the center value, and each different exposure image often focuses on different points, such as darker The exposure image of the most often focuses on the brightest area (such as the sky). The brightest exposure image needs to be enhanced in the details of the darker area. The weight of each exposure image is uniformly averaged and cannot achieve better results. , the fused image is often whitish or blurred

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Multi-exposure image fusion method
  • Multi-exposure image fusion method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025] In order to further illustrate the technical means and effects of the present invention, a detailed description will be given below in conjunction with preferred embodiments of the present invention and accompanying drawings.

[0026] see figure 1 , the present invention provides a multi-exposure image fusion method, comprising the steps of:

[0027] Step S1, extracting the luminance component of the original image, adopting the S-type function to generate K exposure images according to the luminance component, setting K as a positive integer;

[0028] Step S2, calculating the weight of each exposure image according to the average value of the brightness of each exposure image to be enhanced;

[0029] Step S3. Select the corresponding image fusion formula according to the distribution type of the cumulative histogram of the original image, and obtain the brightness value of the target image according to the weight of each exposure image and the image fusion formula.

...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a multi-exposure image fusion method. The multi-exposure image fusion method comprises the following steps: extracting a brightness component of an original image, generating Kexposure images by adopting an S-shaped function according to the brightness component, and calculating the weight of each exposure image according to a brightness mean value of an area needing to beenhanced of each exposure image; and selecting a corresponding image fusion formula according to the distribution type of the cumulative histogram of the original image, and substituting the weight ofeach exposure image into the image fusion formula to obtain the brightness of the target image so as to enhance the details of the target image after image fusion and prevent the target image after image fusion from whitening or blurring.

Description

technical field [0001] The invention relates to the field of image processing, in particular to a multi-exposure image fusion method. Background technique [0002] Thin Film Transistor (TFT) is the main driving element in current Liquid Crystal Display (LCD) and Active Matrix Organic Light-Emitting Diode (AMOLED). It is related to the display performance of the flat panel display device. [0003] Most of the liquid crystal displays currently on the market are backlight liquid crystal displays, which include a liquid crystal display panel and a backlight module. The working principle of the liquid crystal display panel is to pour liquid crystal molecules between the thin film transistor array substrate (ThinFilm Transistor Array Substrate, TFT Array Substrate) and the color filter (ColorFilter, CF) substrate, and apply pixel voltage on the two substrates respectively. and the common voltage, through the electric field formed between the pixel voltage and the common voltage ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06T5/50
CPCG06T5/50G06T2207/10024G06T2207/20221
Inventor 史超超
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products