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Ion accelerator

An ion accelerator and linear accelerator technology, applied in the directions of linear accelerators, plasmas, accelerators, etc., can solve the problems of difficulty in designing beamlines, complex beamlines, etc., and achieve the effect of increasing the amount of ions, simplifying the configuration, and increasing the ion intensity.

Pending Publication Date: 2019-04-26
广东太微加速器有限公司
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Problems solved by technology

[0003] In addition, when using a pulsed ion source utilizing laser heating, etc. as an ion source, the current amount of the ion beam, the charge number of generated ions, etc. vary greatly within a beam generation pulse of several microseconds, by appropriately employing Coulomb repulsion It is very difficult to design beamlines
[0004] In addition, conventional ion accelerators have a problem in that complex beamlines including devices such as focusing lenses are required

Method used

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Embodiment Construction

[0027] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0028] Refer as follows Figure 1-3 The present invention is described:

[0029] An ion accelerator, including a plasma generation source, a vacuum container 1, an ion linear accelerator 2, and a high-voltage power supply (not shown) for raising the vacuum container 1 to a required voltage. The vacuum container 1 is installed on the ion linear accelerator 2 At the entrance of the ion, the ion beam generated by the ion source is directly incident on the ion li...

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Abstract

The invention provides an ion accelerator, which comprises a plasma generating source, a vacuum container, an ionic linear accelerator and a high-voltage power supply used for increasing the voltage of the vacuum container to required voltage. The vacuum container is mounted at an ion inlet of the ionic linear accelerator, and an ion beam generated by the plasma generating source is directly emitted into the ionic linear accelerator from the vacuum container. According to the ion accelerator, the complexity of a combination of an ion source, a bunch and the ionic linear accelerator can be greatly reduced, and the effect of coulomb repulsion is further reduced.

Description

technical field [0001] The invention relates to an ion accelerator. Background technique [0002] In conventional ion accelerator devices, the combination of ion sources, beamlines for transmitting low-energy ion beams, and ion linear accelerators cannot satisfy the Coulomb repulsion in ion beams. When using an ion source with a large current and only a part of the extracted ion beam, the incident conditions of the ion linear accelerator can be met, the divergence of the beam is particularly large, and there is a problem that the number is small. [0003] In addition, when using a pulsed ion source utilizing laser heating, etc. as an ion source, the current amount of the ion beam, the charge number of generated ions, etc. vary greatly within a beam generation pulse of several microseconds, by appropriately employing Coulomb repulsion It is very difficult to design beamlines. [0004] In addition, conventional ion accelerators have a problem in requiring a complicated beaml...

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Application Information

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IPC IPC(8): H05H9/00H05H7/22H05H1/24
CPCH05H1/24H05H7/22H05H9/00
Inventor 钱铁威
Owner 广东太微加速器有限公司
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