Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Chlorosilane pretreatment method

A technology of chlorosilane and polysilicon, which is applied in the field of chlorosilane pretreatment, can solve the problems of damaged analytical instruments, chromatographic separation system damage, and easy blockage of dirty chlorosilane, so as to achieve good test reproducibility and make up for missing items in system monitoring , cost-saving effect

Inactive Publication Date: 2019-05-21
内蒙古通威高纯晶硅有限公司
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] At present, the raw material trichlorosilane used in various polysilicon factories, in the production rectification and purification process, sometimes the samples taken in the laboratory are relatively dirty and have a large amount of suspended solids and particles, which makes the samples unable to be analyzed. The reason is that during chromatographic analysis , the particles and suspended solids in the sample are very easy to block the analytical instrument, and the long-term analysis will also cause damage to the separation system of the chromatograph
The reason is that the dirty chlorosilane produced in the production system of the polysilicon plant is very easy to block and damage the analysis instrument, which makes the sample unable to be analyzed

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Chlorosilane pretreatment method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026] In order to enable those skilled in the art to better understand the technical solution of the invention, the present invention will be further described in detail below in conjunction with specific embodiments.

[0027] Chlorosilane pretreatment method of the present invention, comprises the steps:

[0028] S1 extracts the sample liquid from the rectified solution in the polysilicon production process;

[0029] S2 transfers the sample solution to a centrifuge tube;

[0030] S3 places the centrifuge tube in the centrifuge;

[0031] S4 starts the centrifuge to centrifuge;

[0032] S5 takes the supernatant of the centrifuge tube after centrifugation;

[0033] S6 takes the supernatant and analyzes it with a chromatograph.

[0034] Preferably, after step S1 and before step S2, the temperature of the sample solution is lowered.

[0035] Preferably, after step S5 and before step S6, the supernatant is placed at room temperature.

[0036] The rectification is rectificati...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a chlorosilane pretreatment method, which comprises the following steps: S1, a rectified solution in a polycrystalline silicon production process is subjected to extraction ofa sample liquid; S2, the sample liquid is transferred to a centrifugal tube; S3, the centrifugal tube is placed in a centrifuge; S4, the centrifuge is started for centrifugation; S5, the supernatant liquid in the centrifugal tube after centrifugation is taken; and S6, the supernatant liquid is taken to be analyzed by using a chromatograph. According to the chlorosilane pretreatment method disclosed in the invention, spare part consumption of an injection needle, an injection system and a separation system of a gas chromatography instrument is reduced, and the cost is saved. Through the technology, production analysis data can be effectively provided, production is effectively guided, and a clear judgment basis is provided for the composition content of a dirty material.

Description

technical field [0001] The invention relates to the field of polysilicon technology, in particular to a chlorosilane pretreatment method. Background technique [0002] At present, the raw material trichlorosilane used in various polysilicon factories, in the production rectification and purification process, sometimes the samples taken in the laboratory are relatively dirty and have a large amount of suspended solids and particles, which makes the samples unable to be analyzed. The reason is that during chromatographic analysis , the particles and suspended solids in the sample are very easy to block the analytical instrument, and the long-term analysis will also cause damage to the separation system of the chromatograph. The reason is that the dirty material chlorosilane produced in the production system of the polysilicon plant is very easy to block and damage the analysis instrument, which makes the sample unable to be analyzed. Contents of the invention [0003] In or...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01N30/02G01N30/06G01N30/88
Inventor 曾一文甘居富游书华彭中王亚萍
Owner 内蒙古通威高纯晶硅有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com