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Monolithic intensity correction type lattice structure optical DOE device and design method thereof

A technology of lattice structure and design method, applied in optical components, optics, instruments, etc., can solve the problems of reducing the utilization rate of light energy, improving the difficulty of assembly alignment, etc., and achieves a simple structure, improved test accuracy, and uniform light intensity. Effect

Inactive Publication Date: 2019-05-28
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This solution reduces the difficulty of design and processing, but reduces the utilization rate of light energy and increases the difficulty of assembly alignment

Method used

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  • Monolithic intensity correction type lattice structure optical DOE device and design method thereof
  • Monolithic intensity correction type lattice structure optical DOE device and design method thereof

Examples

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Effect test

Embodiment 1

[0017] Example 1: The system uses a LD laser with a wavelength of 650 nm as the light source, and requires a structured light with a divergence angle of 35°×35°, a number of 900 points, and a regular arrangement of 30×30, and a working distance of 1m. First draw a dot matrix target map, with equal intensity distribution at each point. Adjust the light intensity and coordinates of each point based on the Rayleigh-Somurphy integration. The coordinate adjustment formula is as follows: x 2 =ax 1 ,y 2 =ay 1 ( z is 1m, ), the intensity adjustment formula is as follows: u(x 2 ,y 2 )=u(x 1 ,y 1 )k, The value changes continuously as the position changes. The target map after the coordinate and intensity correction is obtained, and the phase distribution of the diffraction element is obtained through iterative design. After the device is processed, the device is placed in the system for actual testing, and then the light intensity and position are optimized according to the test data...

Embodiment 2

[0018] Embodiment 2: The system uses an LD laser with a wavelength of 830 nm as the light source, and requires a divergence angle of 60°×40°, a number of 35,000 points, and a structured light that is completely randomly arranged, and the use distance is 5m. First draw a dot-matrix target map with equal intensity distribution at each point, such as figure 2 (a) Shown. Adjust the light intensity and coordinates of each point based on the Rayleigh-Somurphy integration. The coordinate adjustment formula is as follows x 2 =ax 1 ,y 2 =ay 1 ( z is 5m, ), the intensity adjustment formula is as follows: u(x 2 ,y 2 )=u(x 1 ,y 1 )k, k changes in stages with position changes: Then get the coordinate and intensity corrected target map, such as figure 2 (b) Shown. The phase distribution of the diffraction element is obtained by iterative design. After the device is processed, the device is placed in the system for actual testing, and then the light intensity and position are optimiz...

Embodiment 3

[0019] Embodiment 3: The system uses a Vcsel laser with a wavelength of 940 nm as the light source, and requires a divergence angle of 60°×60°, a number of points of 8,500, and a structured light that is completely randomly arranged, and the use distance is 2m. First draw a dot matrix target map, with equal intensity distribution at each point. Adjust the coordinates of each point in the dot matrix target map based on the Rayleigh-Somurphy integral, the formula is as follows: 2 =ax 1 ,y 2 =ay 1 ( z is 2m, ), the intensity will not be adjusted first. The phase distribution of the diffraction element is obtained by iterative design. The processed device is placed in the system for actual testing, and then the light intensity and position parameters are adjusted according to the test data to optimize the structure. Through 3 to 5 optimizations and feedback, the inconsistency of the center and edge responses of the receiver camera is overcome to obtain a lattice The structured l...

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Abstract

The invention discloses a monolithic intensity correction type lattice structure optical DOE device and a design method thereof. The monolithic DOE is adopted to realize lattice distribution with a large angle, high uniformity, a high resolution and a small position error. The design process comprises the following steps of: (1) generating a target image according to lattice requirements, and determining the amount and the distribution position of the lattices; (2) adjusting the light intensity and coordinate of each point based on Rayleigh-Sommerfeld integral; the coordinate adjustment formula shown in the description is x2=ax1, y2=ay1, z shown in the description is the distance between a diffraction device and an output surface, an intensity adjustment formula is u (x2, y2) = u (x1, y1)k, wherein k is an intensity adjustment factor; (3) iteratively designing the adjusted target image to obtain the phase distribution of a diffraction element; (4) completing processing the device, placing the device in a system for an actual test, optimizing and adjusting the light intensity and the position according to test data to achieve an ideal result.

Description

Technical field [0001] The invention relates to the field of diffraction element design, in particular to a monolithic intensity correction type dot matrix structured light DOE device and a design method. Background technique [0002] As a new type of human-computer interaction technology, somatosensory technology is considered one of the most exciting scientific and technological achievements in the 21st century. The face recognition technology is similar to this. The principle is to project specially coded infrared structured light into the scene, and then use the sensor to collect the deformed structured light reflected back, and then decode the image to identify the action or judge the object. How to generate high-precision structured light is the key core technology, and the obtained dot matrix image is required to be random, uniform and accurate in position. [0003] The structured light generation method based on the light barrier has low light energy utilization rate and h...

Claims

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Application Information

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IPC IPC(8): G02B27/00
Inventor 邓启凌庞辉曹阿秀王广逸张满史立芳
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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