A reverse conduction insulated gate bipolar transistor structure and its preparation method
A technology of bipolar transistors and insulated gates, applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve the problems of reducing device reliability, low on-resistance, and exacerbating local accumulation of current, reaching the turn-on voltage Suppression of foldback phenomenon, improvement of distribution uniformity, and effect of increasing processing cost
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Embodiment 1
[0048] FIG. 4 is a schematic diagram of a cell cross-sectional structure of the RC-IGBT device 002 according to the first embodiment of the present invention. device
[0050] When the device 002 is in the initial stage of forward turn-on, its electron current path is as shown in FIG. 5 . as in the previous
[0058] According to the working principle of the device 002 of the present invention, its corresponding structural parameters are designed as follows. It should be pointed out that,
[0059] In addition, the present invention also provides a method of manufacturing the device 002. First, as shown in Figure 6, form n
Embodiment 2
[0062] FIG. 15 is a schematic diagram of a cell cross-sectional structure of an RC-IGBT device 003 according to the second embodiment of the present invention. relatively
Embodiment 3
[0064] FIG. 16 is a schematic diagram of a cell cross-sectional structure of an RC-IGBT device 004 according to the third embodiment of the present invention. relatively
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Abstract
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