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Color photovoltaic module, and preparation method and application thereof

A color photovoltaic and component technology, applied in photovoltaic power generation, electrical components, semiconductor devices, etc., can solve the problems of single color and no color during the day, and achieve the effect of improving weather resistance

Inactive Publication Date: 2019-06-21
CSG HOLDING +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Based on this, it is necessary to provide a color photovoltaic module, its preparation method and application, which are suitable for translucent or opaque photovoltaic cell modules, and the preparation method of the color photovoltaic module Relatively simple, no need to add additional procedures, processes and equipment

Method used

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  • Color photovoltaic module, and preparation method and application thereof
  • Color photovoltaic module, and preparation method and application thereof
  • Color photovoltaic module, and preparation method and application thereof

Examples

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preparation example Construction

[0061] The method for preparing the above-mentioned colored photovoltaic module 100 includes the following steps:

[0062]S210 , preparing a functional layer 121 on the surface of the transparent substrate 110 .

[0063] The functional layer 121 includes a high refractive index layer 125 and a low refractive index layer 127 .

[0064] In one embodiment, the functional layer 121 is prepared on the substrate by magnetron sputtering. Preferably, the functional layer 121 is prepared by off-line PVD magnetron sputtering.

[0065] Step S220 , preparing a conductive layer 123 on the surface of the functional layer 121 to obtain a colored transparent conductive film 120 laminated on the surface of the transparent substrate 110 .

[0066] In one embodiment, the conductive layer 123 is prepared by magnetron sputtering. The conductive layer 123 is preferably prepared by off-line PVD magnetron sputtering.

[0067] Preferably, the material, manufacturing process and manufacturing param...

Embodiment 1

[0093] 1. On the 3.20mm ultra-clear glass substrate, deposit the high refractive index layer and the low refractive index layer of the functional layer in sequence. Among them, the high refractive index layer is deposited by direct current sputtering of ITO planar target, and the sputtering conditions are: argon 1000 sccm, oxygen 30 sccm, sputtering power 5 kW, target base distance 6.0 cm, substrate temperature 300 °C; low refractive index layer is made of Made of Si rotating target, 40kHz AC power sputtering deposition, the sputtering conditions are: argon 600sccm, oxygen 400sccm, sputtering power 10kW, target base distance 6.0cm. Then, a conductive layer was deposited on the low refractive index layer by direct current sputtering of an ITO planar target to obtain colored TCO glass. 300°C.

[0094] The colored TCO glass of Example 1 is blue-gray, and its structure is ultra-clear glass (3.20mm) / ITO (16.58nm) / SiO 2 (27.72nm) / ITO(150.00nm), wherein, " / " indicates a stacked str...

Embodiment 2

[0100] 1. Deposit the low refractive index layer and the high refractive index layer of the functional layer on the 3.20mm ultra-clear glass substrate. Among them, the low refractive index layer is deposited by sputtering with Si rotating target and 40kHz AC power supply. The sputtering conditions are: argon gas 600sccm, oxygen 400sccm, sputtering power 10kW, target base distance 6.0cm. The high-refractive index layer was deposited on the low-refractive-index layer by direct current sputtering of an ITO planar target. The sputtering conditions were: argon 1000 sccm, oxygen 20 sccm, sputtering power 5 kW, target base distance 6.0 cm, and substrate temperature 400 °C. Then, on the low refractive index layer of the functional layer, use the ITO planar target to deposit the conductive layer by direct current sputtering to obtain colored TCO glass. The sputtering conditions are: argon gas 1000 sccm, oxygen gas 20 sccm, sputtering power 5kW, target base distance 6.0cm , The substrat...

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Abstract

The invention relates to a color photovoltaic module, and a preparation method and an application thereof. The color photovoltaic module comprises a color transparent conductive substrate, a photovoltaic function layer, a back electrode layer, a metal flow guide tape, a glue layer, a packaging layer and a junction box which are stacked in sequence, wherein the color transparent conductive substrate comprises a transparent substrate, and a color transparent conductive thin film stacked on the transparent substrate; and the color transparent conductive thin film comprises a functional layer stacked on the surface of the transparent substrate and a conductive layer stacked on the surface of the functional layer. The color photovoltaic module realizes color impression through sunlight reflection control outdoors, and is very suitable for outdoor application; and the embarrassing situation of no color rendering in the daytime is avoided.

Description

technical field [0001] The invention relates to a color photovoltaic component, its preparation method and application. Background technique [0002] In thin film photovoltaic modules, transparent conductive oxide (TCO) glass is an important substrate material. Photovoltaic module manufacturers generally obtain TCO glass in the form of outsourcing, and continue the next step of photoelectric thin film deposition and module preparation on TCO glass. Hangzhou Longyan, a professional manufacturer of CdTe thin-film photovoltaic modules, and Firstsolar of the United States, both use TCO glass produced by Japanese plate glass for the properties of CdTe thin-film cells, which is colorless and transparent. Using such TCO glass products, the photovoltaic curtain wall shows the true color of photovoltaic modules, which is dark or black, and the color is relatively single. [0003] At present, in view of the problem of single color tone of transparent conductive film products, such a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/04H01L31/048H01L31/054H01L31/18
CPCY02E10/52Y02P70/50
Inventor 宋秋明洪尚坤崔平生王琦
Owner CSG HOLDING
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