Microwave-enhanced selective swelling pore-forming method for separation membrane
A selective and membrane-separating technology, applied in chemical instruments and methods, semi-permeable membrane separation, membranes, etc., can solve problems such as high temperature and time-consuming, and achieve the effect of simple preparation method and improved membrane production efficiency
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[0058] Example 1
[0059] 0.02gPS 55 -P2VP 18.5 The block copolymer was added to 2g of chloroform solution and fully stirred to dissolve. The polymer solution was filtered with a 200μm pore size filter to remove large particles of impurities; 70μL of the above solution was spin-coated on the silicon wafer substrate at 2000rpm 60s, and then Place it in an oven at 60°C for 3 hours to completely volatilize the solvent to obtain a dense block copolymer film; immerse the film in a container containing ethanol and treat it under 400W microwave conditions for 25s, and remove the film immediately after microwave treatment , Place to dry at room temperature.
[0060] figure 2 It is an SEM image of the surface of the porous block copolymer film prepared in this example. It can be seen from the figure that the surface of the film exhibits a low-degree double continuous pore structure after only 25 seconds of 400W microwave treatment, and the film has a relatively high open porosity.
[0061] ...
Example Embodiment
[0062] Example 2
[0063] 0.02gPS 55 -P2VP 18.5 The block copolymer was added to 2g of chloroform solution and fully stirred to dissolve. The polymer solution was filtered with a 200μm pore size filter to remove large particles of impurities; 70μL of the above solution was spin-coated on the silicon wafer substrate at 2000rpm 60s, and then Place it in an oven at 60°C for 3 hours to completely volatilize the solvent to obtain a dense block copolymer film; immerse the film in a container containing ethanol and treat it under 400W microwave conditions for 40s, and remove the film immediately after microwave treatment , Place to dry at room temperature.
[0064] image 3 This is the SEM image of the surface of the porous block copolymer film prepared in this example. It can be seen from the figure that the surface of the film presents a high degree of double continuous channel structure after 400W microwave treatment for only 40s, and the film opening rate is relatively increased, indi...
Example Embodiment
[0066] Example 3
[0067] 0.02gPS 55 -P2VP 18.5 The block copolymer was added to 2g of chloroform solution and fully stirred to dissolve. The polymer solution was filtered with a 200μm pore size filter to remove large particles of impurities; 70μL of the above solution was spin-coated on the silicon wafer substrate at 2000rpm 60s, and then Place it in an oven at 60°C for 3 hours to completely volatilize the solvent to obtain a dense block copolymer film; immerse the film in a container containing ethanol and treat it under 800W microwave conditions for 25s, and remove the film immediately after microwave treatment , Place to dry at room temperature.
[0068] Figure 4 It is the SEM image of the surface of the porous block copolymer film prepared in this example. It can be seen from the figure that the surface of the film presents a high degree of double continuous pore structure after 800W microwave treatment for only 25s, and the opening rate of the film is relatively increased, in...
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