The invention relates to a cold isostatic pressing forming preparation method of a nickel oxide-based ceramic target material, wherein the method comprises the following steps: A, preparing raw materials: preparing mixed powder of nickel oxide powder and doped source powder, wherein the total mass fraction of doped source elements in the mixed powder is not more than 10%, wherein the doping sourceelement is selected from one or more of 0-6% of Li, 0-0.3% of Na, 0-1.0% of Mg, 0-0.1% of Al, 0-0.1% of Si, 0-0.15% of K, 0-12% of Zn, 0-1.5% of Zr, 0-1.2% of Mn, 0-10% of Cu, 0-1.2% of Cr, 0-0.3% ofV, 0-10% of W and 0-2.5% of Ti; B, carrying out spray drying; C, compacting by vibration; D, feeding a mold into a cold isostatic pressing chamber for pressing; E, degumming a biscuit; F, sintering;G, cooling after heat preservation is finished; and H, machining or not machining according to needs. The preparation method can be used for preparing the nickel oxide-based ceramic which is good in conductivity, relatively high in purity and fine in grain size.