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Microwave hydrothermal preparation method of NiTiO3 nano film

A microwave hydrothermal, nano-film technology, applied in chemical instruments and methods, crystal growth, coating, etc., to achieve the effect of short reaction period, avoid curling, and easy availability of raw materials

Inactive Publication Date: 2010-07-14
SHAANXI UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

So far, no impurity-free high-purity NiTiO has been prepared at a relatively low temperature 3 Reports on Nanofilms

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0012] Embodiment 1: Add analytically pure nickel nitrate hexahydrate in dehydrated alcohol, and constantly stir, be mixed with Ni 2+ A transparent solution with a concentration of 0.5mol / L, the resulting solution is denoted as A; analytically pure tetrabutyl titanate is added to the A solution, so that Ni 2+ with Ti 4+ The molar ratio of citric acid and all cations is 1:1, and it is constantly stirred, and then citric acid is added to the solution, so that the molar ratio of citric acid to all cations is 0.7:1, and finally water with a volume ratio of 5:1 to absolute ethanol is added. and acetylacetone of 7:1, and the solution obtained after stirring evenly is recorded as B, which is used as a coating solution for later use; the silicon substrate is placed in hydrogen peroxide and ultrasonically vibrated for 1 hour to make it active, and then the silicon substrate is placed in a drying oven at 50 Dry at ℃; pour the B solution prepared above into the hydrothermal reaction ket...

Embodiment 2

[0013] Embodiment 2: Add analytically pure nickel nitrate hexahydrate in dehydrated alcohol, and constantly stir, be mixed with Ni 2+ A transparent solution with a concentration of 0.3mol / L, the resulting solution is denoted as A; analytically pure tetrabutyl titanate is added to the A solution, so that Ni 2+ with Ti 4+ The molar ratio of citric acid and all cations is 0.9:1, and stirring constantly, then add citric acid to the solution, so that the molar ratio of citric acid to all cations is 0.9:1, and finally add water with a volume ratio of 10:1 to absolute ethanol and 15:1 acetyl acetone, after stirring evenly, the obtained solution is recorded as B, and it is used as a coating solution for later use; the silicon substrate is placed in hydrogen peroxide and ultrasonically vibrated for 1 hour to make it active, and then the silicon substrate is placed in a drying oven at 50 Dry at ℃; pour the B solution prepared above into the hydrothermal reaction kettle, and the filling...

Embodiment 3

[0014] Embodiment 3: Add analytically pure nickel nitrate hexahydrate in dehydrated alcohol, and constantly stir, be mixed with Ni 2+ A transparent solution with a concentration of 0.7mol / L, the obtained solution is denoted as A; analytically pure tetrabutyl titanate is added to the A solution, so that Ni 2+ with Ti 4+ The molar ratio of citric acid and all cations is 1:1, and keep stirring, then add citric acid to the solution, so that the molar ratio of citric acid to all cations is 1:1, and finally add water with a volume ratio of 6:1 to absolute ethanol and acetylacetone of 7:1, and the solution obtained after stirring evenly is recorded as B, which is used as a coating solution for later use; the silicon substrate is placed in hydrogen peroxide and ultrasonically vibrated for 1 hour to make it active, and then the silicon substrate is placed in a drying oven at 50 Dry at ℃; pour the B solution prepared above into the hydrothermal reaction kettle, and the filling degree i...

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Abstract

The invention discloses a microwave hydrothermal preparation method of a NiTiO3 nano film, comprising the following steps: adding analytically pure nickel nitrate hexahydrate in ethanol to obtain a solution A; adding analytically pure tetrabutyl titanate, citric acid, water and acetylacetone in the solution A to obtain a solution B; placing a silicon substrate in hydrogen peroxide for ultrasonic oscillation and drying; pouring the solution B in a hydro-thermal reaction kettle, placing the silicon substrate in the hydro-thermal reaction kettle and immersing in film-coating liquid; sealing the hydro-thermal reaction kettle and placing in an MDS-8 type warm-pressing double control microwave hydro-thermal reactor; selecting a temperature controlling mode or a pressure controlling mode to react, and cooling naturally to the room temperature after reaction; and opening the hydro-thermal reaction kettle, taking the silicon substrate, respectively washing with deionized water, absolute ethyl alcohol or isopropanol, and drying to obtain the final product NiTiO3 nano film. The reaction can be finished in liquid phase in one time, post-treatment is avoided, the process equipment is simple, and the obtained film has high purity and favorable uniformity.

Description

technical field [0001] The invention relates to a method for preparing NiTiO 3 Thin film method, specifically relating to a NiTiO 3 Microwave hydrothermal preparation method of nano film. Background technique [0002] Titanium-based oxide MTiO containing different metals 3 (M=Ni, Pb, Fe, Co, Cu, and Zn) are widely used in solid oxide fuel cell electrodes (SOFC), metal-air barrier materials, and inorganic functional materials for gas sensors. NiTiO 3 The triangular crystal system belonging to the ilmenite structure, due to its semiconductivity and weak magnetism, is an important chemical material and electrical material, used in many industrial fields, such as semiconductor rectifiers, bicarbonate catalysts and surface-coated dyeing mixes It can also be used as a cladding material to reduce friction and wear under high temperature conditions. NiTiO 3 With high Q value, low dielectric constant and good acousto-optic and electro-optical properties, it has wide application...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B29/32C30B7/10C23C26/00
Inventor 黄剑锋郝品曹丽云吴建鹏
Owner SHAANXI UNIV OF SCI & TECH
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