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Plane polishing device

A polishing device and plane technology, applied in the direction of grinding/polishing safety device, grinding driving device, grinding/polishing equipment, etc., can solve the problems of short service life, poor polishing effect, complex and disordered movement, etc., and achieve Long working life, cost saving, uniform wear effect

Pending Publication Date: 2019-09-10
ZHEJIANG UNIV OF TECH
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Problems solved by technology

[0004] In order to overcome the disadvantages of poor polishing effect and short service life of existing plane polishing machines, the present invention designs a plane polishing device, a swing mechanism with a crank rocker as the core principle, and a reciprocating and translational grip on the upper end. The hand makes the movement of the workpiece on the polishing disc more complex and disorderly, so that the polishing accuracy of the workpiece is higher, and the grinding of the polishing disc is more uniform and the service life is longer

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Embodiment Construction

[0034] The present invention will be further described below in conjunction with the accompanying drawings.

[0035] refer to Figure 1 to Figure 4 , a plane polishing device, the main structure schematic diagram is as follows figure 1 , including the parallel swing mechanism and the translation mechanism on the upper end of the polishing disc, refer to figure 2 The parallel swing mechanism is mainly a crank rocker mechanism, and the translation mechanism at the upper end of the polishing disc is driven by a crank slider mechanism.

[0036] The crank rocker mechanism is easy to manufacture, and the kinematic pairs are all low, which can bear a large load, and the speed can be controlled. Although the flexibility in realizing the motion law of the driving rod is poor, in order to realize the semi-planar motion, as expected in this patent, it is more suitable to realize the swing motion. Now the research on the link mechanism in this field is relatively mature and in-depth. ...

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Abstract

A plane polishing device comprises a parallel swinging mechanism and a top swinging mechanism; the parallel swinging mechanism is a crank rocking rod mechanism; the top swinging mechanism is a crank slider mechanism; the parallel swinging mechanism comprises a speed adjusting braking motor, a driving wheel, a belt, a driven wheel, a supporting rod, connection rods and grippers; the speed adjustingbraking motor drives the driving wheel; the driving wheel drives the driven wheel to rotate through the belt; the two connection rods are correspondingly in linkage with the driving wheel and the driven wheel; the other end of each connection rod is in linkage with the corresponding gripper, so that the crank rocking rod mechanism is formed, and therefore the grippers are driven to drive a machined workpiece to swing on a polishing disk; and each gripper is in an arc shape, and the relative positions of the two grippers do not change. According to the plane polishing device, for the swingingmechanism with a crank rocking rod as a core principle, the grippers horizontally moving in a reciprocating manner at the upper end are used in cooperation, so that the movement of the workpiece on the polishing disk is more complicated and disorderly, and therefore the polishing precision of the workpiece is higher, grinding of the polishing disk is more uniform, and the service life is longer.

Description

technical field [0001] The invention mainly relates to the field of plane polishing machines, in particular to a plane polishing device. Background technique [0002] Today's electronic technology products, such as crystal vibrator substrates, silicon wafers, lithium niobate substrates, etc., not only have extremely high requirements for surface flatness, but also require both ends of the substrate to be parallel and have no crystal orientation errors. According to the traditional The polishing method, the surface of the polished mold seems to meet the requirements, but its surface shape is easy to replace and needs further modification, and when the traditional polishing method is processed, the operator's processing technology is more stringent, so the production efficiency is low and the difficulty is more difficult when using the traditional polishing method big. Therefore, in order to ensure the performance of components and reduce the cost of polishing, these electron...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B27/00B24B7/22B24B41/06B24B55/00B24B47/04
CPCB24B27/0015B24B7/228B24B41/068B24B55/00B24B47/04
Inventor 周佩剑颜朝寿蒋豪杰郑水华牟介刚
Owner ZHEJIANG UNIV OF TECH