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Holder for holding and for protecting a side of a photomask or a photomask having pellicle from a cleaning medium, method for cleaning a photomask or a photomask with pellicle and device for opening and closing a holder

一种防尘薄膜、光掩模的技术，应用在固持器的装置领域

Active Publication Date: 2019-09-27
SUSS MICROTEC PHOTOMASK EQUIP GMBH & CO KG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

While in the past, pellicles and their frames were attached to the sides of photomasks so that the surrounding edge area of ​​the shield outside the frame remained free and could be used as a sealing surface, some of today's or future pellicles Extends all the way to or even beyond the edge of the photomask

Method used

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  • Holder for holding and for protecting a side of a photomask or a photomask having pellicle from a cleaning medium, method for cleaning a photomask or a photomask with pellicle and device for opening and closing a holder
  • Holder for holding and for protecting a side of a photomask or a photomask having pellicle from a cleaning medium, method for cleaning a photomask or a photomask with pellicle and device for opening and closing a holder
  • Holder for holding and for protecting a side of a photomask or a photomask having pellicle from a cleaning medium, method for cleaning a photomask or a photomask with pellicle and device for opening and closing a holder

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Embodiment Construction

[0044] In the following description, directional indications such as top, bottom, left, right, horizontal, vertical, and their derivatives refer to representations in the drawings and should not be viewed in a limiting manner, even though they may refer to preferred orientation.

[0045] figure 1 Receiving and protecting the photomask 2 or the other side of the photomask with a pellicle from the cleaning medium during cleaning of one side (i.e. the side of the unprotected photomask 2) Holder 1. Photomask 2 is only shown in dashed lines on figure 1 Medium and can be a photomask without a pellicle or a photomask with a pellicle. in accordance with figure 1 In the presentation of , seals are not shown for simplicity of presentation. figure 2 draw through according to figure 1 A schematic cross-sectional view of the holder 1 of , and image 3 According to figure 2 Individual cross-sectional views of the seals installed in them. When the term photomask is used, this shal...

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Abstract

The invention relates to a holder for holding and for protecting a side of a photomask or a photomask having pellicle from a cleaning medium, to a method for cleaning such a photomask, and to a device for opening and closing a holder. The holder (1) has a base having at least three support elements (15), which are arranged at a distance from a bottom (9) of the base for holding and for retaining the photomask or the photomask having pellicle, and has sealing frame (7, 20, 21), having a top side (24) and a bottom side (25), wherein the bottom side can be placed onto the base, and wherein the sealing frame has a center opening (26), which is dimensioned in such a way that the center opening can accommodate the photomask with spacing. A peripheral, elastic sealing element (22) is provided on the sealing frame, which sealing element extends from the inner periphery of the center opening into the center opening at an angle to the top side of the sealing frame, wherein, in an unloaded state, the sealing element has an inner periphery that is smaller than the outer periphery of the photomask and, in a loaded state, the sealing element peripherally contacts, at the side edge, a photomask accommodated in the center opening.

Description

technical field [0001] The present invention relates to a holder for receiving and protecting the sides of a photomask or a pellicle from a cleaning medium, a light for cleaning a photomask or a pellicle A method of masking the sides and a means of switching a holder of the above type. Background technique [0002] In particular, in the field of semiconductor technology, it is known to use photomasks for photolithography processes. For good processing results, photomasks must be cleaned regularly. To protect certain surfaces of photomasks against contamination by particles, in some cases so-called pellicles are used. [0003] A pellicle is a thin film or film that is held at a distance from the surface of the photomask to be protected by, for example, a frame, which is glued to the sides of the photomask to be protected. The particles therefore cannot reach the respective surfaces of the photomask, and if present, they stick to the pellicle. The pellicle is disposed at a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G03F1/66
CPCG03F7/70925G03F7/70983G03F1/82G03F1/66G03F7/20
Inventor 杰士·克鲁伯格亚当·贝沙伍威·戴兹
Owner SUSS MICROTEC PHOTOMASK EQUIP GMBH & CO KG
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