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Photomask structure

A technology of photomasks and light-shielding masks, which is applied in optics, originals for photomechanical processing, instruments, etc., can solve the problem of real-time monitoring effects that affect the alignment accuracy of the film layer, cannot accurately reflect the alignment accuracy of the film layer, and the film layer Boundary large random error and other issues

Pending Publication Date: 2019-10-08
WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Because the taper angle of the photoresist is too small, there is a large random error when using the photosensitive device CCD to capture the film layer boundary, which cannot accurately reflect the alignment accuracy between the film layers, which seriously affects the alignment of the film layers during mass production. The real-time monitoring effect of precision has a great impact on the improvement of production yield

Method used

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  • Photomask structure
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Embodiment Construction

[0029] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary only for explaining the present invention and should not be construed as limiting the present invention.

[0030] In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Orientation indicated by rear, left, right, vertical, horizontal, top, bottom, inside, outside, clockwise, counterclockwise, etc. The positional relationship is based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the present invention and simplifying the description, rather than indicating ...

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Abstract

The invention provides a photomask structure, which comprises a transparent substrate, a light-shielding mask layer and a phase shift mask layer, wherein the transparent substrate comprises a light-transmitting region and at least one light-shielding region surrounded by the light-transmitting region; the light-shielding mask layer is arranged on the transparent substrate and fully covers the light-shielding region; and the phase shift mask layer is arranged on the transparent substrate and connected to the light-shielding mask layer, the phase shift mask layer is connected to the edge of thelight-shielding mask layer and located in the light-transmitting region, and the phase shift mask layer is used for enabling light scattered by the phase shift mask layer and light scattered by the light-shielding mask layer to be cancelled at the interface.

Description

technical field [0001] The invention relates to the field of array substrate manufacturing, in particular to a photomask structure. Background technique [0002] In the process flow of OLED panel manufacturing, dozens of thin film layers need to be fabricated on the substrate, and the precise alignment between these thin film layers plays a decisive role in the successful manufacture of the array substrate. In order to monitor the alignment accuracy of each film layer and its alignment layer in real time, the interlayer alignment confirmation operation is usually designed to monitor it in real time after exposure and before etching. If it is found that the alignment deviation exceeds the allowable range, the photoresist needs to be removed, and then the alignment photolithography process is performed again until the alignment accuracy is within the allowable range. For example, after the POLY layer is fabricated, subsequent layers such as GE1, GE2, CNT and SD need to confir...

Claims

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Application Information

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IPC IPC(8): G03F1/26
CPCG03F1/26
Inventor 张永晖李鹏吴绍静
Owner WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD