Surface preparation method capable of preparing various nanowire structures
A technology of nanowires and red copper, applied in the direction of nanotechnology, nanotechnology, nanotechnology for materials and surface science, etc., to achieve controllable surface morphology, diversified structural forms, and improve the effect of condensation heat transfer
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Embodiment 1
[0018] Surface preparation of vertical, agglomerated, and pit-shaped copper nanowire structures
[0019] A. Take the copper block and polish it with sandpaper, put it in acetone, ethanol, and deionized water for 10 minutes, and then take it out and blow it dry with nitrogen.
[0020] B. In the fixture, put the plexiglass block, the copper block connected to the working electrode, the porous anodized aluminum template, the filter paper dripped with the electroplating solution, the copper block connected to the counter electrode, and the plexiglass block from bottom to top, and fully clamp Tight, template models 450-360, 450-280, 450-200, 450-110, 125-30, 65-10. The voltage setting of the electrochemical workstation is -0.8V, and the time setting is 900s.
[0021]D. The working selection of the three-electrode system: the distance between the copper block covered with the template and another copper block is 20mm, and the distance between the reference electrode and the two ele...
Embodiment 2
[0025] Surface preparation of vertical and agglomerated copper nanowires with different heights
[0026] A. Take the copper block and polish it with sandpaper, put it in acetone, ethanol, and deionized water for 10 minutes, and then take it out and blow it dry with nitrogen.
[0027] B. In the two-electrode system provided by the fixture, put in order from bottom to top the plexiglass block, the copper block connected to the working electrode, the porous anodized aluminum template, the filter paper dripped with electroplating solution, the copper block connected to the counter electrode, and the plexiglass Block, and fully clamped, the template model is 450-360, 450-200. The voltage setting of the electrochemical workstation is -0.8V, and the time setting is 900s.
[0028] C. In the three-electrode system provided by the electroplating pool, the distance between the cathode copper block and the anode copper block is 20mm, and the distance between the reference electrode and t...
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