tube deposition system

Abstract

The invention provides a tubular deposition system, which includes a slide unit, a pretreatment chamber, X reaction modules, a preheating unit, a heating unit and a transfer unit. The pre-processing chamber and the X reaction modules, and the X reaction modules are arranged along the vertical direction, and each of the reaction modules is provided with at least one tubular reaction chamber along the horizontal direction body, which significantly improves the space utilization rate and is conducive to maximizing production capacity. The preheating unit and the transfer unit enable the slide unit to reach the preheating temperature in the pre-processing chamber, and then transfer to the tubular reaction chamber through the transfer unit, avoiding the The deposition layer existing in the tubular reaction chamber has an adverse effect on the heating effect, which is beneficial to the stability and repeatability of the process.

Description

technical field [0001] The invention relates to the technical field of manufacturing crystalline silicon solar cells, in particular to a tubular deposition system. Background technique [0002] With the breakthrough in photoelectric conversion efficiency of crystalline silicon solar cells, from the perspective of industrial application, it is very important to increase the production capacity of equipment to achieve continuous production. In the prior art, the preparation process of crystalline silicon solar cells using tubular plasma-enhanced chemical vapor deposition (Plasma Enhanced Chemical Vapor Deposition, PECVD) equipment is usually loaded with wafers to be processed into the tubular PECVD equipment After the reaction chamber, start the heating process again, so as to facilitate the subsequent chemical vapor deposition treatment of the silicon wafer to be processed. [0003] However, as the production time of the process increases, the inner wall of the reaction cham...

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Problems solved by technology

[0007] It is common knowledge in this field that the chain and cluster structures in the plane layout are easier to realize the direct connection of each reaction chamber and maintain the same vacuum degree of each chamber at the same time, but the tubular reaction chamber in the spatial layout, It is impossible to directly connect the reaction chambers and ensure material transfer, and the switching of process conditions between the chambers brought about by the separation and distribution of the pretreatment chambers still requires engineering and technical solutions. The system distribution of processing chambers is unprecedented in the industry; however, due to the significant space utilization and capacity expansion capabilities of the tubular reaction chamber system, as well as the low operating costs brought about by its high utilization rate and high production capacity , so that how to solve the unfavorable factors of deposition in the tubular reaction chamber, further expand the production capacity of the tubular reaction chamber, and how to ensure the process stability in the solution has become a challenging and attractive realistic demand

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