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A Fast Light Source Optimization Method Using Compressed Sensing

A light source optimization and compressed sensing technology, applied in optics, optomechanical equipment, microlithography exposure equipment, etc., can solve problems such as many iteration optimization times, affecting the optimization efficiency of SO problem, etc., to improve computing efficiency, taking into account imaging performance, Light source graphics with simple structure

Active Publication Date: 2021-06-15
BEIJING INSTITUTE OF TECHNOLOGYGY
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Problems solved by technology

However, the gradient projection sparse reconstruction algorithm requires more iterative optimization times in the optimization process of the light source, which affects the optimization efficiency of the SO problem.
[0005] For this reason, the operational efficiency of the traditional SO method needs to be further improved and improved

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  • A Fast Light Source Optimization Method Using Compressed Sensing
  • A Fast Light Source Optimization Method Using Compressed Sensing
  • A Fast Light Source Optimization Method Using Compressed Sensing

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Embodiment Construction

[0023] In order to enable those skilled in the art to better understand the solutions of the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application.

[0024] The principle of this embodiment: the imaging performance of an actual lithography system is usually evaluated by indicators such as imaging error, mask complexity, and process window. In order to effectively improve the calculation efficiency of light source optimization, take into account the imaging performance of the lithography system, and make the optimized light source graphic structure relatively simple, this embodiment constructs the light source optimization problem as a 2-norm image restoration problem, namely:

[0025]

[0026] Among them, the constrained linear equations Make the aerial image corresponding to the optimized light source as close a...

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Abstract

The present invention provides a fast light source optimization method using compressed sensing. First, the illumination cross coefficient matrix I cc Downsampling with the target graphic vector to reduce the dimension of the two, and then constructing the objective function according to the reduced dimension, so that the light source optimization problem is converted into an image recovery problem solving the 2-norm, and finally the light source graphic is realized by using the AMP algorithm Fast optimization; Compared with the existing gradient projection sparse reconstruction algorithm, the AMP algorithm in the present invention can not only improve the calculation efficiency of light source optimization, but also can take into account the imaging performance of the lithography system, and the optimized light source graphic structure is relatively simple .

Description

technical field [0001] The invention belongs to the technical field of lithographic resolution enhancement, and in particular relates to a light source optimization method using compressed sensing. Background technique [0002] Optical lithography is the current mainstream lithography technology. It uses the principle of optical projection imaging to transfer the integrated circuit pattern on the mask to the wafer coated with photoresist through step-and-scan exposure. With the rapid development of the semiconductor industry, the feature size of VLSI is also shrinking. The lithography system is the main core equipment in the IC manufacturing industry. The current mainstream lithography technology mainly adopts the deep ultraviolet immersion lithography technology with a light source wavelength of 193nm. [0003] As the lithography technology node enters 45-14nm, the critical dimensions of integrated circuits have entered the deep sub-wavelength range. At this time, the reso...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/705G03F7/70508
Inventor 马旭王志强
Owner BEIJING INSTITUTE OF TECHNOLOGYGY
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