Anode plate, preparation method thereof and display panel
A display panel and anode plate technology, which is applied in semiconductor/solid-state device manufacturing, electrical components, electric solid-state devices, etc., can solve the problems of poor long-term use stability and low product yield, and improve anti-oxidation performance, reduce dark lines, The effect of improving device yield and long-term use stability
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[0041] In addition, the present invention also provides a method for preparing the above-mentioned anode plate. Referring to 2, the method for preparing the anode plate includes the following steps:
[0042] The anode layer, the first protective layer, the conductive metal layer and the second protective layer are sequentially sputtered on the substrate, so that the first protective layer, the conductive metal layer and the second protective layer form a lead layer, and the anode layer and the second protective layer are sputtered. The wiring layer is sequentially exposed, developed, etched and stripped, and patterned to design the patterned wiring layer;
[0043]Sputtering an outer protective layer on the patterned lead layer, for example, physical vapor deposition (Physical Vapor Deposition, PVD) can be used to plate molybdenum (Mo). In order to ensure the barrier effect, the thickness of Mo should not be too small, generally not less than
[0044] The outer protective lay...
Embodiment 1
[0051] This embodiment provides an anode plate, such as figure 1 As shown, the anode plate is arranged on the substrate 1, specifically, the substrate 1 is glass, and also includes an anode layer 2, which is stacked on the substrate 1;
[0052] The patterned lead layer 3 is stacked on the anode layer 2. The patterned lead layer 3 includes a first protective layer 3a, a second protective layer 3c and a conductive metal layer 3b disposed between them. The anode layer 2 is far away from the substrate 1. One side is provided with the first protective layer 3a; specifically, the ratio of the thickness of the anode layer 2 to the first protective layer 3a is 1:1-25:1, for example, the thickness of the anode layer 2 is 100nm-250nm; the first protective layer The thickness of 3a is 10nm-100nm, by optimizing the thickness ratio of the anode layer 2 and the first protective layer 3a, it is beneficial to improve the bonding effect between the two.
[0053] The outer protective layer 4 c...
Embodiment 2
[0057] The present embodiment provides the preparation method of above-mentioned anode plate, refer to figure 2 Shown, the preparation method of anode plate comprises the steps:
[0058] The anode layer, the first protective layer, the conductive metal layer and the second protective layer are sequentially sputtered on the substrate, so that the first protective layer, the conductive metal layer and the second protective layer form a lead layer, and the anode layer and the second protective layer are sputtered. The wiring layer is sequentially exposed, developed, etched and stripped, and patterned to design the patterned wiring layer;
[0059] Sputter an outer protective layer on the patterned lead layer, for example, PVD molybdenum (Mo) plating can be used. In order to ensure the barrier effect, the thickness of Mo should not be too small, generally not less than
[0060] The outer protective layer is sequentially exposed, developed, etched and degummed, and the patterned...
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Abstract
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